Inventor
SOCHA ROBERT JOHN
US25 patents
⚠️ This page may combine multiple inventors who share the name “SOCHA ROBERT JOHN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
15 patentsUS6871337B2Mar 22, 2005
Illumination optimization for specific mask patterns
ASML NETHERLANDS BV88 citations97
US8356261B1Jan 15, 2013
Determining the gradient and hessian of the image log slope for design rule optimization for accelerating source mask optimization (SMO)
ASML NETHERLANDS BV28 citations92
US6887625B2May 3, 2005
Assist features for use in lithographic projection
ASML NETHERLANDS BV25 citations89
US10670973B2Jun 2, 2020
Coloring aware optimization
ASML NETHERLANDS BV16 citations84
US7548302B2Jun 16, 2009
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV12 citations82
US11079684B2Aug 3, 2021
Measurement apparatus and a method for determining a substrate grid
ASML NETHERLANDS BV3 citations73
US10670975B2Jun 2, 2020
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
ASML NETHERLANDS BV2 citations73
US10437158B2Oct 8, 2019
Metrology by reconstruction
ASML NETHERLANDS BV2 citations73
US10417359B2Sep 17, 2019
Optical metrology of lithographic processes using asymmetric sub-resolution features to enhance measurement
ASML NETHERLANDS BV6 citations72
US10132763B2Nov 20, 2018
Inspection method and apparatus, lithographic system and device manufacturing method
ASML NETHERLANDS BV2 citations72
US10054862B2Aug 21, 2018
Inspection apparatus, inspection method, lithographic apparatus, patterning device and manufacturing method
ASML NETHERLANDS BV3 citations72
US11966166B2Apr 23, 2024
Measurement apparatus and a method for determining a substrate grid
ASML NETHERLANDS BV1 citations62
US10996571B2May 4, 2021
Adjustment of a metrology apparatus or a measurement thereby based on a characteristic of a target measured
ASML NETHERLANDS BV0 citations62
US7317506B2Jan 8, 2008
Variable illumination source
ASML NETHERLANDS BV2 citations60
US9053280B2Jun 9, 2015
Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions
ASML NETHERLANDS BV0 citations52
SOCHA ROBERT JOHN
5 patentsUS8640058B2Jan 28, 2014
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
SOCHA ROBERT JOHN4 citations72
US8060842B2Nov 15, 2011
Method, program product and apparatus for model based geometry decomposition for use in a multiple exposure process
SOCHA ROBERT JOHN6 citations72
US8612900B2Dec 17, 2013
Rule optimization in lithographic imaging based on correlation of functions representing mask and predefined optical conditions
SOCHA ROBERT JOHN2 citations61
US8340394B2Dec 25, 2012
Method, program product and apparatus for performing a model based coloring process for geometry decomposition for use in a multiple exposure process
SOCHA ROBERT JOHN3 citations61
US8224061B2Jul 17, 2012
Method, program product, and apparatus for performing a model based coloring process for pattern decomposition for use in a multiple exposure process
SOCHA ROBERT JOHN0 citations51