Inventor
KON JUNICHI
JP33 patents
⚠️ This page may combine multiple inventors who share the name “KON JUNICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
22 patentsUS7338750B2Mar 4, 2008
Resist pattern thickness reducing material, resist pattern and process for forming thereof, and semiconductor device and process for manufacturing thereof
FUJITSU LTD25 citations92
US7189783B2Mar 13, 2007
Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
FUJITSU LTD13 citations92
US6506534B1Jan 14, 2003
Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices
FUJITSU LTD29 citations92
US6844135B2Jan 18, 2005
Chemically amplified resist material and patterning method using same
FUJITSU LTD16 citations84
US7465527B2Dec 16, 2008
Resist material, resist pattern and forming method for the same, and a semiconductor device and manufacturing method for the same
FUJITSU LTD7 citations74
US6794112B2Sep 21, 2004
Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices
FUJITSU LTD4 citations74
US6773867B2Aug 10, 2004
Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices
FUJITSU LTD7 citations74
US10236319B2Mar 19, 2019
Photodetector and imaging device
FUJITSU LTD2 citations72
US8860211B2Oct 14, 2014
Semiconductor device, semiconductor device manufacturing method, and electronic device
FUJITSU LTD3 citations63
US8349542B2Jan 8, 2013
Manufacturing process of semiconductor device
FUJITSU LTD2 citations63
US7744768B2Jun 29, 2010
Resist pattern thickening material, resist pattern and forming process thereof, and semiconductor device and manufacturing process thereof
FUJITSU LTD3 citations63
US7220628B2May 22, 2007
Semiconductor device and manufacturing method thereof, and gate electrode and manufacturing method thereof
FUJITSU LTD5 citations63
US6794113B2Sep 21, 2004
Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices
FUJITSU LTD3 citations63
US6787288B2Sep 7, 2004
Negative resist composition, method for the formation of resist patterns and process for the production of electronic devices
FUJITSU LTD2 citations63
US6465137B2Oct 15, 2002
Resist composition and pattern forming process
FUJITSU LTD5 citations62
US10418500B2Sep 17, 2019
Infrared detector, imaging device, and imaging system
FUJITSU LTD0 citations52
US9926422B2Mar 27, 2018
Bump-forming material, method for producing electronic component, method for producing semiconductor device, and semiconductor device
FUJITSU LTD0 citations52
US9496222B2Nov 15, 2016
Semiconductor device including insulating films with different moisture resistances and fabrication method thereof
FUJITSU LTD0 citations52
US9354517B2May 31, 2016
Resist composition and method for forming pattern
FUJITSU LTD0 citations52
US7830013B2Nov 9, 2010
Material for forming adhesion reinforcing layer, adhesion reinforcing layer, semiconductor device, and manufacturing method thereof
FUJITSU LTD1 citations52
US7723016B2May 25, 2010
Method for forming resist pattern and method for manufacturing a semiconductor device
FUJITSU LTD0 citations52
US7364829B2Apr 29, 2008
Resist pattern thickening material, process for forming resist pattern, and process for manufacturing semiconductor device
FUJITSU LTD0 citations52
KON JUNICHI
7 patentsUS8313892B2Nov 20, 2012
Multi-layer body, method for forming resist pattern, method for manufacturing device having pattern by fine processing and electronic device
KON JUNICHI3 citations62
US8940622B2Jan 27, 2015
Method for manufacturing compound semiconductor device and detergent
KON JUNICHI0 citations51
US8759161B2Jun 24, 2014
Surface coating method, semiconductor device, and circuit board package
KON JUNICHI1 citations51
US8557144B2Oct 15, 2013
Material for forming conductive antireflection film, method for forming conductive antireflection film, method for forming resist pattern, semiconductor device, and magnetic head
KON JUNICHI1 citations51
US8338072B2Dec 25, 2012
Resist composition, resist pattern forming process, and method for manufacturing semiconductor device
KON JUNICHI1 citations51
US8057986B2Nov 15, 2011
Method for forming resist pattern and method for manufacturing a semiconductor device
KON JUNICHI0 citations51
US8795951B2Aug 5, 2014
Material for forming resist sensitization film and production method of semiconductor device
KON JUNICHI0 citations41