P

Inventor

SHEU YI-MING

TW52 patents
⚠️ This page may combine multiple inventors who share the name “SHEU YI-MING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAIWAN SEMICONDUCTOR MFG CO LTD

32 patents
US10109721B2Oct 23, 2018

Horizontal gate-all-around device having wrapped-around source and drain

TAIWAN SEMICONDUCTOR MFG CO LTD140 citations99
US9754840B2Sep 5, 2017

Horizontal gate-all-around device having wrapped-around source and drain

TAIWAN SEMICONDUCTOR MFG CO LTD18 citations93
US9419136B2Aug 16, 2016

Dislocation stress memorization technique (DSMT) on epitaxial channel devices

TAIWAN SEMICONDUCTOR MFG CO LTD9 citations84
US8981479B2Mar 17, 2015

Multi-gate semiconductor devices and methods of forming the same

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations84
US10084063B2Sep 25, 2018

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD7 citations83
US9455346B2Sep 27, 2016

Channel strain inducing architecture and doping technique at replacement poly gate (RPG) stage

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations82
US11145762B2Oct 12, 2021

Multi-gate device

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations73
US10734500B2Aug 4, 2020

Horizontal gate all-around device having wrapped-around source and drain

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10008603B2Jun 26, 2018

Multi-gate device and method of fabrication thereof

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations73
US9899517B2Feb 20, 2018

Dislocation stress memorization technique (DSMT) on epitaxial channel devices

TAIWAN SEMICONDUCTOR MFG CO LTD4 citations73
US9899475B2Feb 20, 2018

Epitaxial channel with a counter-halo implant to improve analog gain

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US10868175B2Dec 15, 2020

Method for manufacturing semiconductor structure

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations72
US10741688B2Aug 11, 2020

Structure and method for integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US9893183B2Feb 13, 2018

Semiconductor structure and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD5 citations72
US9831341B2Nov 28, 2017

Structure and method for integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD3 citations72
US10276717B2Apr 30, 2019

Channel strain inducing architecture and doping technique at replacement poly gate (RPG) stage

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations71
US11239341B2Feb 1, 2022

Horizontal gate all-around device having wrapped-around source and drain

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations63
US12581697B2Mar 17, 2026

Semiconductor device with silicide-embedded stressor source and drain structure

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11955554B2Apr 9, 2024

Method of fabricating a multi-gate device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11804546B2Oct 31, 2023

Structure and method for integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11715785B2Aug 1, 2023

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11502198B2Nov 15, 2022

Structure and method for integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11393926B2Jul 19, 2022

Multi-gate device

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11004955B2May 11, 2021

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US10516047B2Dec 24, 2019

Structure and formation method of semiconductor device structure

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations62
US9502559B2Nov 22, 2016

Dislocation stress memorization technique (DSMT) on epitaxial channel devices

TAIWAN SEMICONDUCTOR MFG CO LTD2 citations62
US9837533B2Dec 5, 2017

Semiconductor structure and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US9502409B2Nov 22, 2016

Multi-gate semiconductor devices

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9502253B2Nov 22, 2016

Method of manufacturing an integrated circuit

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9425099B2Aug 23, 2016

Epitaxial channel with a counter-halo implant to improve analog gain

TAIWAN SEMICONDUCTOR MFG CO LTD1 citations52
US10522657B2Dec 31, 2019

Semiconductor device and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations51
US10861972B2Dec 8, 2020

Channel strain inducing architecture and doping technique at replacement poly gate (RPG) stage

TAIWAN SEMICONDUCTOR MFG CO LTD0 citations50

TAIWAN SEMICONDUCTOR MFG

13 patents
US7545001B2Jun 9, 2009

Semiconductor device having high drive current and method of manufacture therefor

TAIWAN SEMICONDUCTOR MFG28 citations92
US6673683B1Jan 6, 2004

Damascene gate electrode method for fabricating field effect transistor (FET) device with ion implanted lightly doped extension regions

TAIWAN SEMICONDUCTOR MFG42 citations92
US6670226B2Dec 30, 2003

Planarizing method for fabricating gate electrodes

TAIWAN SEMICONDUCTOR MFG20 citations92
US7071515B2Jul 4, 2006

Narrow width effect improvement with photoresist plug process and STI corner ion implantation

TAIWAN SEMICONDUCTOR MFG42 citations90
US7429769B2Sep 30, 2008

Recessed channel field effect transistor (FET) device

TAIWAN SEMICONDUCTOR MFG11 citations84
US7371629B2May 13, 2008

N/PMOS saturation current, HCE, and Vt stability by contact etch stop film modifications

TAIWAN SEMICONDUCTOR MFG10 citations84
US7012014B2Mar 14, 2006

Recessed gate structure with reduced current leakage and overlap capacitance

TAIWAN SEMICONDUCTOR MFG18 citations84
US6974730B2Dec 13, 2005

Method for fabricating a recessed channel field effect transistor (FET) device

TAIWAN SEMICONDUCTOR MFG10 citations74
US7399679B2Jul 15, 2008

Narrow width effect improvement with photoresist plug process and STI corner ion implantation

TAIWAN SEMICONDUCTOR MFG5 citations71
US6703187B2Mar 9, 2004

Method of forming a self-aligned twin well structure with a single mask

TAIWAN SEMICONDUCTOR MFG6 citations63
US7598130B2Oct 6, 2009

Method for reducing layout-dependent variations in semiconductor devices

TAIWAN SEMICONDUCTOR MFG2 citations60
US9281372B2Mar 8, 2016

Metal gate structure and manufacturing method thereof

TAIWAN SEMICONDUCTOR MFG1 citations52
US6800516B2Oct 5, 2004

Electrostatic discharge device protection structure

TAIWAN SEMICONDUCTOR MFG1 citations51

BHUWALKA KRISHNA KUMAR

1 patent

WU ZHIQIANG

1 patent

DIAZ CARLOS H

1 patent

WANG CHIH-CHING

1 patent

HO JON-HSU

1 patent

Showing the top 50 of 52 patents by PatentIndex Score.