Inventor

TAVASSOLI HAMID

US30 patents

⚠️ This page may combine multiple inventors who share the name “TAVASSOLI HAMID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAVASSOLI HAMID

APPLIED MATERIALS INC

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Method for agile workpiece temperature control in a plasma reactor using a thermal model

Symmetric plasma process chamber

Process kit design for in-chamber heater and wafer rotating mechanism

Symmetric plasma process chamber

Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching

Electron beam plasma source with remote radical source

Distributed electro-static chuck cooling

Symmetric plasma process chamber

Apparatus for controlling temperature uniformity of a substrate

Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow

Collimator for use in a physical vapor deposition chamber

BUCHBERGER JR DOUGLAS A

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Plasma reactor with wafer backside thermal loop, two-phase internal pedestal thermal loop and a control processor governing both loops

Capacitively coupled plasma reactor having very agile wafer temperature control

Plasma reactor with feed forward thermal control system using a thermal model for accommodating RF power changes or wafer temperature changes

Capacitively coupled plasma reactor having very agile wafer temperature control

TAVASSOLI HAMID

Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity

Assembly for delivering RF power and DC voltage to a plasma processing chamber

Multi-zoned plasma processing electrostatic chuck with improved temperature uniformity

BRILLHART PAUL LUKAS

Plasma reactor with a multiple zone thermal control feed forward control apparatus

Capacitively coupled plasma reactor having a cooled/heated wafer support with uniform temperature distribution

BERA KALLOL

Apparatus for controlling gas flow in a semiconductor substrate processing chamber

Apparatus for controlling the temperature uniformity of a substrate

SILVEIRA FERNANDO M

Temperature control in plasma processing apparatus using pulsed heat transfer fluid flow