Inventor
SCHAUER REINHARD
DE18 patents
⚠️ This page may combine multiple inventors who share the name “SCHAUER REINHARD”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SILTRONIC AG
12 patentsUS11380621B2Jul 5, 2022
Susceptor for holding a semiconductor wafer having an orientation notch, a method for depositing a layer on a semiconductor wafer, and semiconductor wafer
SILTRONIC AG10 citations84
US7935614B2May 3, 2011
Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers
SILTRONIC AG11 citations83
US10991614B2Apr 27, 2021
Susceptor for holding a semiconductor wafer with an orientation notch during the deposition of a layer on a front side of the semiconductor wafer and method for depositing the layer by using the susceptor
SILTRONIC AG3 citations72
US7101794B2Sep 5, 2006
Coated semiconductor wafer, and process and device for producing the semiconductor wafer
SILTRONIC AG8 citations72
US7659207B2Feb 9, 2010
Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafer
SILTRONIC AG7 citations65
US7922813B2Apr 12, 2011
Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers
SILTRONIC AG4 citations61
US7838398B2Nov 23, 2010
Epitaxially coated semiconductor wafer and device and method for producing an epitaxially coated semiconductor wafer
SILTRONIC AG6 citations61
US7579261B2Aug 25, 2009
Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers
SILTRONIC AG5 citations61
US11578424B2Feb 14, 2023
Epitaxially coated semiconductor wafer of monocrystalline silicon and method for production thereof
SILTRONIC AG0 citations60
US9991208B2Jun 5, 2018
Susceptor for holding a semiconductor wafer having an orientation notch, a method for depositing a layer on a semiconductor wafer, and semiconductor wafer
SILTRONIC AG0 citations51
US11982015B2May 14, 2024
Method for depositing an epitaxial layer on a front side of a semiconductor wafer, and device for carrying out the method
SILTRONIC AG0 citations50
US10597795B2Mar 24, 2020
Method for producing a semiconductor wafer with epitaxial layer in a deposition chamber, apparatus for producing a semiconductor wafer with epitaxial layer, and semiconductor wafer with epitaxial layer
SILTRONIC AG0 citations34