Inventor

SAINO Takaharu

JP2 patents

Patents

2 patents

US12562352B2Feb 24, 2026

Prediction method and information processing apparatus for predicting the process result in a plasma etching process

TOKYO ELECTRON LTD0 citations56

US12381069B2Aug 5, 2025

Plasma processing apparatus and plasma processing method

TOKYO ELECTRON LTD0 citations41