Inventor
KAI YASUNOBU
JP20 patents
⚠️ This page may combine multiple inventors who share the name “KAI YASUNOBU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
9 patentsUS7934175B2Apr 26, 2011
Parameter adjustment method, semiconductor device manufacturing method, and recording medium
TOSHIBA KK8 citations84
US7941782B2May 10, 2011
Pattern layout of integrated circuit
TOSHIBA KK2 citations61
US7682757B2Mar 23, 2010
Pattern layout for forming integrated circuit
TOSHIBA KK6 citations61
US10630059B2Apr 21, 2020
Surface emitting quantum cascade laser
TOSHIBA KK0 citations52
US10424899B2Sep 24, 2019
Surface emitting quantum cascade laser
TOSHIBA KK0 citations52
US9086634B2Jul 21, 2015
Production method and evaluation apparatus for mask layout
TOSHIBA KK1 citations51
US9257367B2Feb 9, 2016
Integrated circuit device, method for producing mask layout, and program for producing mask layout
TOSHIBA KK1 citations49
US10490979B2Nov 26, 2019
Substrate including photonic crystal and method for manufacturing the same, and surface emitting quantum cascade laser
TOSHIBA KK0 citations41
US8956791B2Feb 17, 2015
Exposure tolerance estimation method and method for manufacturing semiconductor device
TOSHIBA KK0 citations40
EISAI CO LTD
5 patentsUS4921850AMay 1, 1990
3-propenylcephem derivative
EISAI CO LTD5 citations73
US5128465AJul 7, 1992
Process for the preparation of cephem derivatives and intermediates therefor
EISAI CO LTD4 citations62
US5089491AFeb 18, 1992
3-propenylcephem derivative
EISAI CO LTD2 citations62
US5006649AApr 9, 1991
3-propenylcephem derivative
EISAI CO LTD1 citations62
US4929612AMay 29, 1990
Thiadiazolylacetamide cephem derivatives
EISAI CO LTD4 citations62
KAI YASUNOBU
3 patentsUS8288812B2Oct 16, 2012
Semiconductor device and method of manufacturing the same
KAI YASUNOBU3 citations59
US8423922B2Apr 16, 2013
Photomask designing method and photomask designing program
KAI YASUNOBU2 citations49
US8336000B2Dec 18, 2012
Method for determining position of auxiliary pattern, method for manufacturing photomask, and method for manufacturing semiconductor device
KAI YASUNOBU0 citations34