Inventor
KAWASUMI YASUSHI
JP11 patents
Patents
11 patentsUS6143190ANov 7, 2000
Method of producing a through-hole, silicon substrate having a through-hole, device using such a substrate, method of producing an ink-jet print head, and ink-jet print head
CANON KK151 citations99
US5952694ASep 14, 1999
Semiconductor device made using processing from both sides of a workpiece
CANON KK53 citations96
US5534069AJul 9, 1996
Method of treating active material
CANON KK47 citations96
US6329265B1Dec 11, 2001
Method of making a semiconductor device using processing from both sides of a workpiece
CANON KK41 citations92
US5776255AJul 7, 1998
Chemical vapor deposition apparatus
CANON KK43 citations92
US5580822ADec 3, 1996
Chemical vapor deposition method
CANON KK27 citations92
US5447568ASep 5, 1995
Chemical vapor deposition method and apparatus making use of liquid starting material
CANON KK33 citations92
US6475563B2Nov 5, 2002
Method for forming a thin film using a gas
CANON KK14 citations84
US6156657ADec 5, 2000
Method of treating active material
CANON KK11 citations73
US6004885ADec 21, 1999
Thin film formation on semiconductor wafer
CANON KK13 citations73
US5476815ADec 19, 1995
Manufacturing method of semiconductor device
CANON KK15 citations73