Inventor
RUBNER ROLAND
28 patents
Patents
28 patentsUS4339521AJul 13, 1982
Heat resistant positive resists containing polyoxazoles
SIEMENS AG121 citations97
US4395482AJul 26, 1983
Method for the preparation of heat-resistant relief structures using positive resists
SIEMENS AG86 citations96
US3957512AMay 18, 1976
Method for the preparation of relief structures
SIEMENS AG127 citations94
US4371685AFeb 1, 1983
Radiation-reactive precursor stages of highly heat-resistant polymers
SIEMENS AG33 citations92
US4040831AAug 9, 1977
Method for the preparation of relief structures
SIEMENS AG49 citations91
US4469408ASep 4, 1984
Liquid-crystal display having orienting polymer with flexible bridges
SIEMENS AG25 citations82
US4329556AMay 11, 1982
N-Azidosulfonylaryl-maleinimides
SIEMENS AG25 citations82
US4311785AJan 19, 1982
Method for the preparation of highly heat-resistant relief structures and the use thereof
SIEMENS AG27 citations82
US4287294ASep 1, 1981
Method for the preparation of relief structures by phototechniques
SIEMENS AG24 citations82
US5108860AApr 28, 1992
Electrophotographic recording material and method for the manufacture thereof
SIEMENS AG6 citations74
US4619500AOct 28, 1986
Method for producing orientation layers for liquid crystal displays and liquid crystal displays having orientation layers
SIEMENS AG14 citations74
US4590103AMay 20, 1986
Method for the preparation of thin polyimide film
SIEMENS AG17 citations74
US4514043AApr 30, 1985
Method for the preparation of orientation layers for liquid crystal displays and liquid crystal displays having orientation layers
SIEMENS AG7 citations74
US4446266AMay 1, 1984
N,N'-Bis-salicyloyl-hydrazine as a metal deactivator
SIEMENS AG14 citations74
US4397999AAug 9, 1983
Polyimidazole and polyimidazopyrrolone precursor stages and the preparation thereof
SIEMENS AG10 citations74
US4385165AMay 24, 1983
Polyimide, polyisoindoloquinazoline dione, polyoxazine dione and polyquinazoline dione precursor stages and the manufacture
SIEMENS AG17 citations74
US4366230ADec 28, 1982
Method for the preparation of highly heat-resistant relief structures and the use thereof
SIEMENS AG8 citations74
US4332883AJun 1, 1982
Method for the manufacture of highly heat-resistant relief structures
SIEMENS AG9 citations74
US4292398ASep 29, 1981
Method for the preparation of relief structures by phototechniques
SIEMENS AG7 citations74
US4045223AAug 30, 1977
Method for the preparation of layer structures
SIEMENS AG9 citations72
US4405707ASep 20, 1983
Method of producing relief structures for integrated semiconductor circuits
SIEMENS AG9 citations71
US4283505AAug 11, 1981
Method for cross-linking and stabilizing polymers which can be cross-linked radically
SIEMENS AG14 citations70
US4395481AJul 26, 1983
Method for the manufacture of resist structures
SIEMENS AG9 citations69
US4398009AAug 9, 1983
Polyoxazole precursor and the preparation thereof
SIEMENS AG6 citations63
US4332882AJun 1, 1982
Method for the preparation of highly heat-resistant relief
SIEMENS AG6 citations63
US4302233ANov 24, 1981
Method for the manufacture of a high-tensile-strength light wave-guide
SIEMENS AG2 citations61
US4088489AMay 9, 1978
Method for the preparation of relief structures
SIEMENS AG6 citations61
US4072524AFeb 7, 1978
Mixture yielding thermally stable photo-cross-linkable layers and foils
SIEMENS AG5 citations60