Inventor
EARLY KATHLEEN R
US22 patents
⚠️ This page may combine multiple inventors who share the name “EARLY KATHLEEN R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
20 patentsUS6534243B1Mar 18, 2003
Chemical feature doubling process
ADVANCED MICRO DEVICES INC249 citations99
US6291137B1Sep 18, 2001
Sidewall formation for sidewall patterning of sub 100 nm structures
ADVANCED MICRO DEVICES INC132 citations98
US6094335AJul 25, 2000
Vertical parallel plate capacitor
ADVANCED MICRO DEVICES INC69 citations96
US5939750AAug 17, 1999
Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringers
ADVANCED MICRO DEVICES INC44 citations96
US6197455B1Mar 6, 2001
Lithographic mask repair using a scanning tunneling microscope
ADVANCED MICRO DEVICES INC25 citations93
US6423475B1Jul 23, 2002
Sidewall formation for sidewall patterning of sub 100 nm structures
ADVANCED MICRO DEVICES INC35 citations92
US6269322B1Jul 31, 2001
System and method for wafer alignment which mitigates effects of reticle rotation and magnification on overlay
ADVANCED MICRO DEVICES INC45 citations90
US6030868AFeb 29, 2000
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation
ADVANCED MICRO DEVICES INC16 citations84
US6316804B1Nov 13, 2001
Oxygen implant self-aligned, floating gate and isolation structure
ADVANCED MICRO DEVICES INC5 citations74
US6214737B1Apr 10, 2001
Simplified sidewall formation for sidewall patterning of sub 100 nm structures
ADVANCED MICRO DEVICES INC14 citations74
US6066530AMay 23, 2000
Oxygen implant self-aligned, floating gate and isolation structure
ADVANCED MICRO DEVICES INC9 citations74
US5978441ANov 2, 1999
Extreme ultraviolet lithography mask blank and manufacturing method therefor
ADVANCED MICRO DEVICES INC10 citations74
US6455888B1Sep 24, 2002
Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringers
ADVANCED MICRO DEVICES INC10 citations73
US6232002B1May 15, 2001
Bilayer anti-reflective coating and etch hard mask
ADVANCED MICRO DEVICES INC7 citations73
US6350559B1Feb 26, 2002
Method for creating thinner resist coating that also has fewer pinholes
ADVANCED MICRO DEVICES INC4 citations63
US6221768B1Apr 24, 2001
Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringers
ADVANCED MICRO DEVICES INC3 citations63
US6352930B1Mar 5, 2002
Bilayer anti-reflective coating and etch hard mask
ADVANCED MICRO DEVICES INC5 citations62
US6110833AAug 29, 2000
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation
ADVANCED MICRO DEVICES INC4 citations62
US6043120AMar 28, 2000
Elimination of oxynitride (ONO) etch residue and polysilicon stringers through isolation of floating gates on adjacent bitlines by polysilicon oxidation
ADVANCED MICRO DEVICES INC6 citations62
US6117597ASep 12, 2000
Extreme ultraviolet lithography mask blank and manufacturing method therefor
ADVANCED MICRO DEVICES INC1 citations52