Inventor
YASUNAMI SHOICHIRO
JP35 patents
⚠️ This page may combine multiple inventors who share the name “YASUNAMI SHOICHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJI PHOTO FILM CO LTD
27 patentsUS6001139ADec 14, 1999
Nonaqueous secondary battery having multiple-layered negative electrode
FUJI PHOTO FILM CO LTD121 citations98
US5707756AJan 13, 1998
Non-aqueous secondary battery
FUJI PHOTO FILM CO LTD255 citations97
US5686203ANov 11, 1997
Non-aqueous secondary battery
FUJI PHOTO FILM CO LTD86 citations96
US6852467B2Feb 8, 2005
Positive resist composition
FUJI PHOTO FILM CO LTD25 citations93
US6555289B2Apr 29, 2003
Positive photoresist composition
FUJI PHOTO FILM CO LTD35 citations93
US6296985B1Oct 2, 2001
Positive photoresist composition comprising a polysiloxane
FUJI PHOTO FILM CO LTD27 citations93
US5340672AAug 23, 1994
Secondary battery
FUJI PHOTO FILM CO LTD24 citations93
US5237031AAug 17, 1993
Organic solid electrolyte
FUJI PHOTO FILM CO LTD26 citations93
US6371995B1Apr 16, 2002
Nonaqueous secondary battery and method for preparing same
FUJI PHOTO FILM CO LTD35 citations92
US6902862B2Jun 7, 2005
Resist composition
FUJI PHOTO FILM CO LTD16 citations84
US6777161B2Aug 17, 2004
Lower layer resist composition for silicon-containing two-layer resist
FUJI PHOTO FILM CO LTD14 citations84
US6696219B2Feb 24, 2004
Positive resist laminate
FUJI PHOTO FILM CO LTD15 citations84
US6589705B1Jul 8, 2003
Positive-working photoresist composition
FUJI PHOTO FILM CO LTD19 citations84
US6773862B2Aug 10, 2004
Negative resist composition
FUJI PHOTO FILM CO LTD18 citations83
US6387590B1May 14, 2002
Positive photoresist composition
FUJI PHOTO FILM CO LTD13 citations74
US6270941B1Aug 7, 2001
Positive silicone-containing photosensitive composition
FUJI PHOTO FILM CO LTD14 citations74
US5350648ASep 27, 1994
Nonaqueous secondary battery
FUJI PHOTO FILM CO LTD16 citations73
US7090960B2Aug 15, 2006
Negative resist composition
FUJI PHOTO FILM CO LTD2 citations63
US5250409AOct 5, 1993
Silver halide photographic material
FUJI PHOTO FILM CO LTD3 citations63
US5153115AOct 6, 1992
Silver halide photographic materials and method for manufacture thereof
FUJI PHOTO FILM CO LTD5 citations63
US7083892B2Aug 1, 2006
Resist composition
FUJI PHOTO FILM CO LTD6 citations62
US6479213B2Nov 12, 2002
Positive photoresist composition
FUJI PHOTO FILM CO LTD0 citations52
US6346363B2Feb 12, 2002
Positive photoresist composition
FUJI PHOTO FILM CO LTD1 citations52
US5108885AApr 28, 1992
Silver halide photographic material containing crosslinked polymer
FUJI PHOTO FILM CO LTD0 citations42
US7105273B2Sep 12, 2006
Positive resist composition
FUJI PHOTO FILM CO LTD0 citations41
US6887647B2May 3, 2005
Negative-working resist composition for electron beams or x-rays
FUJI PHOTO FILM CO LTD0 citations41
US6746813B2Jun 8, 2004
Negative resist composition
FUJI PHOTO FILM CO LTD0 citations41
FUJIFILM CORP
7 patentsUS7351515B2Apr 1, 2008
Positive resist composition and pattern-forming method using the same
FUJIFILM CORP2 citations63
US7326513B2Feb 5, 2008
Positive working resist composition
FUJIFILM CORP3 citations63
US7232640B1Jun 19, 2007
Positive resist composition
FUJIFILM CORP5 citations63
US7432034B2Oct 7, 2008
Negative resist composition
FUJIFILM CORP1 citations52
US7361446B2Apr 22, 2008
Positive resist composition
FUJIFILM CORP0 citations52
US7217493B2May 15, 2007
Positive resist composition
FUJIFILM CORP0 citations42
US7332258B2Feb 19, 2008
Positive resist composition and process for forming pattern using the same
FUJIFILM CORP0 citations41