Inventor
BEEMS MARCEL HENDRIKUS MARIA
NL15 patents
⚠️ This page may combine multiple inventors who share the name “BEEMS MARCEL HENDRIKUS MARIA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
13 patentsUS7349069B2Mar 25, 2008
Lithographic apparatus and positioning apparatus
ASML NETHERLANDS BV146 citations96
US7405811B2Jul 29, 2008
Lithographic apparatus and positioning apparatus
ASML NETHERLANDS BV136 citations95
US6853440B1Feb 8, 2005
Position correction in Y of mask object shift due to Z offset and non-perpendicular illumination
ASML NETHERLANDS BV20 citations90
US6747729B2Jun 8, 2004
Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition
ASML NETHERLANDS BV20 citations88
US7265366B2Sep 4, 2007
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV12 citations83
US7443511B2Oct 28, 2008
Integrated plane mirror and differential plane mirror interferometer system
ASML NETHERLANDS BV2 citations62
US7349072B2Mar 25, 2008
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV4 citations62
US10809631B2Oct 20, 2020
Method of monitoring and device manufacturing method
ASML NETHERLANDS BV0 citations51
US7474409B2Jan 6, 2009
Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof
ASML NETHERLANDS BV0 citations51
US7352473B2Apr 1, 2008
Lithographic apparatus, device manufacturing method, and computer program
ASML NETHERLANDS BV1 citations50
US7177059B2Feb 13, 2007
Device and method for manipulation and routing of a metrology beam
ASML NETHERLANDS BV0 citations47
US7978339B2Jul 12, 2011
Lithographic apparatus temperature compensation
ASML NETHERLANDS BV0 citations41
US10527957B2Jan 7, 2020
Method and apparatus for processing a substrate in a lithographic apparatus
ASML NETHERLANDS BV0 citations35