Inventor
ADAMS YOKO YAMAGUCHI
US3 patents
Patents
3 patentsUS7491343B2Feb 17, 2009
Line end shortening reduction during etch
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US7682985B2Mar 23, 2010
Dual doped polysilicon and silicon germanium etch
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US7316785B2Jan 8, 2008
Methods and apparatus for the optimization of etch resistance in a plasma processing system
LAM RES CORP3 citations60