Inventor
NISHIMURA RIEKO
JP22 patents
⚠️ This page may combine multiple inventors who share the name “NISHIMURA RIEKO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NUFLARE TECHNOLOGY INC
20 patentsUS7834333B2Nov 16, 2010
Charged particle beam lithography system and method for evaluating the same
NUFLARE TECHNOLOGY INC13 citations84
US8779379B2Jul 15, 2014
Acquisition method of charged particle beam deflection shape error and charged particle beam writing method
NUFLARE TECHNOLOGY INC8 citations83
US7679068B2Mar 16, 2010
Method of calculating deflection aberration correcting voltage and charged particle beam writing method
NUFLARE TECHNOLOGY INC8 citations83
US8872139B2Oct 28, 2014
Settling time acquisition method
NUFLARE TECHNOLOGY INC8 citations79
US9659746B2May 23, 2017
Adjustment method for charged particle beam drawing apparatus and charged particle beam drawing method
NUFLARE TECHNOLOGY INC2 citations73
US10283314B2May 7, 2019
Charged particle beam writing apparatus, and charged particle beam writing method
NUFLARE TECHNOLOGY INC2 citations72
US9147553B2Sep 29, 2015
Method for acquiring settling time
NUFLARE TECHNOLOGY INC5 citations72
US8803108B2Aug 12, 2014
Method for acquiring settling time
NUFLARE TECHNOLOGY INC4 citations72
US11211227B2Dec 28, 2021
Multi charged particle beam evaluation method and multi charged particle beam writing device
NUFLARE TECHNOLOGY INC0 citations62
US10755893B2Aug 25, 2020
Charged particle beam writing method and charged particle beam writing apparatus
NUFLARE TECHNOLOGY INC1 citations62
US7893411B2Feb 22, 2011
Charged-particle beam writing apparatus and charged-particle beam writing method
NUFLARE TECHNOLOGY INC5 citations62
US7705322B2Apr 27, 2010
Charged-particle beam writing method
NUFLARE TECHNOLOGY INC6 citations62
US11901156B2Feb 13, 2024
Multi-charged-particle-beam writing apparatus and multi-charged-particle-beam writing method
NUFLARE TECHNOLOGY INC0 citations57
US10483082B2Nov 19, 2019
Evaluation method, correction method, recording medium and electron beam lithography system
NUFLARE TECHNOLOGY INC0 citations51
US9997329B2Jun 12, 2018
Evaluation method, correction method, recording medium and electron beam lithography system
NUFLARE TECHNOLOGY INC0 citations51
US10586682B2Mar 10, 2020
Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate
NUFLARE TECHNOLOGY INC0 citations43
US7777205B2Aug 17, 2010
Electron beam lithography system
NUFLARE TECHNOLOGY INC0 citations41
US10622186B2Apr 14, 2020
Charged particle beam writing apparatus and charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations40
US10468232B2Nov 5, 2019
Charged particle beam writing apparatus and charged particle beam writing method
NUFLARE TECHNOLOGY INC0 citations40
US10345724B2Jul 9, 2019
Position correction method of stage mechanism and charged particle beam lithography apparatus
NUFLARE TECHNOLOGY INC0 citations40