P

Inventor

SHIN NEUNGHO

US7 patents
⚠️ This page may combine multiple inventors who share the name “SHIN NEUNGHO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

APPLIED MATERIALS INC

3 patents
US7132369B2Nov 7, 2006

Method of forming a low-K dual damascene interconnect structure

APPLIED MATERIALS INC27 citations92
US7435685B2Oct 14, 2008

Method of forming a low-K dual damascene interconnect structure

APPLIED MATERIALS INC13 citations83
US7256134B2Aug 14, 2007

Selective etching of carbon-doped low-k dielectrics

APPLIED MATERIALS INC16 citations82

LAM RES CORP

2 patents
US10217610B2Feb 26, 2019

Arrangements for manipulating plasma confinement within a plasma processing system and methods thereof

LAM RES CORP1 citations61
US7977123B2Jul 12, 2011

Arrangements and methods for improving bevel etch repeatability among substrates

LAM RES CORP4 citations59

SHIN NEUNGHO

1 patent
US8501283B2Aug 6, 2013

Methods for depositing bevel protective film

SHIN NEUNGHO4 citations54

JUCO ELLER Y

1 patent
US9275838B2Mar 1, 2016

Arrangements for manipulating plasma confinement within a plasma processing system and methods thereof

JUCO ELLER Y1 citations45