Inventor
LI LUMIN
US36 patents
⚠️ This page may combine multiple inventors who share the name “LI LUMIN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LAM RES CORP
24 patentsUS6527911B1Mar 4, 2003
Configurable plasma volume etch chamber
LAM RES CORP218 citations99
US6178919B1Jan 30, 2001
Perforated plasma confinement ring in plasma reactors
LAM RES CORP208 citations97
US7732728B2Jun 8, 2010
Apparatuses for adjusting electrode gap in capacitively-coupled RF plasma reactor
LAM RES CORP52 citations96
US6833325B2Dec 21, 2004
Method for plasma etching performance enhancement
LAM RES CORP70 citations96
US6746961B2Jun 8, 2004
Plasma etching of dielectric layer with etch profile control
LAM RES CORP61 citations96
US6106663AAug 22, 2000
Semiconductor process chamber electrode
LAM RES CORP71 citations96
US6506685B2Jan 14, 2003
Perforated plasma confinement ring in plasma reactors
LAM RES CORP64 citations95
US6090304AJul 18, 2000
Methods for selective plasma etch
LAM RES CORP104 citations94
US7977390B2Jul 12, 2011
Method for plasma etching performance enhancement
LAM RES CORP29 citations92
US7749353B2Jul 6, 2010
High aspect ratio etch using modulation of RF powers of various frequencies
LAM RES CORP30 citations92
US7683289B2Mar 23, 2010
Apparatus and method for controlling plasma density profile
LAM RES CORP31 citations92
US7525787B2Apr 28, 2009
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same
LAM RES CORP29 citations92
US7144521B2Dec 5, 2006
High aspect ratio etch using modulation of RF powers of various frequencies
LAM RES CORP24 citations92
US6984288B2Jan 10, 2006
Plasma processor in plasma confinement region within a vacuum chamber
LAM RES CORP52 citations92
US6716303B1Apr 6, 2004
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
LAM RES CORP20 citations92
US7405521B2Jul 29, 2008
Multiple frequency plasma processor method and apparatus
LAM RES CORP35 citations91
US7455748B2Nov 25, 2008
Magnetic enhancement for mechanical confinement of plasma
LAM RES CORP9 citations84
US7169695B2Jan 30, 2007
Method for forming a dual damascene structure
LAM RES CORP16 citations84
US7632375B2Dec 15, 2009
Electrically enhancing the confinement of plasma
LAM RES CORP11 citations82
US11594400B2Feb 28, 2023
Multi zone gas injection upper electrode system
LAM RES CORP6 citations74
US8000082B2Aug 16, 2011
Electrostatic chuck assembly with dielectric material and/or cavity having varying thickness, profile and/or shape, method of use and apparatus incorporating same
LAM RES CORP5 citations74
US7838086B2Nov 23, 2010
Magnetic enhancement for mechanical confinement of plasma
LAM RES CORP3 citations63
US7977242B2Jul 12, 2011
Double mask self-aligned double patterning technology (SADPT) process
LAM RES CORP4 citations62
US7105102B2Sep 12, 2006
Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
LAM RES CORP0 citations52