Inventor

HSU DUAN-FU STEPHEN

US57 patents

⚠️ This page may combine multiple inventors who share the name “HSU DUAN-FU STEPHEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HSU DUAN-FU STEPHEN

ASML NETHERLANDS BV

Coloring aware optimization

Flows of optimization for lithographic processes

Patterning device, a method of making the same, and a patterning device design method

Flows of optimization for patterning processes

Flows of optimization for patterning processes

Patterning device, a method of making the same, and a patterning device design method

Image log slope (ILS) optimization

Binarization method and freeform mask optimization flow

Wavefront optimization for tuning scanner based on performance matching

Method and apparatus for source mask optimization configured to increase scanner throughput for a patterning process

Flows of optimization for patterning processes

Method and apparatus for imaging using narrowed bandwidth

Rule-based deployment of assist features

Method of determining characteristic of patterning process based on defect for reducing hotspot

Wavefront optimization for tuning scanner based on performance matching

Method for optimizing a patterning device pattern

Aberration impact systems, models, and manufacturing processes

Simulation of lithography using multiple-sampling of angular distribution of source radiation

Imaging via zeroth order suppression

Optimization of assist features and source

Method and apparatus for diffraction pattern guided source mask optimization

Mapping of patterns between design layout and patterning device

Flows of optimization for lithographic processes

Rule-based deployment of assist features

ASML MASKTOOLS BV

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

Method and apparatus for performing model-based layout conversion for use with dipole illumination

Method, program product and apparatus for performing double exposure lithography

Method of removing assist features utilized to improve process latitude

Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout

Method and apparatus for performing dark field double dipole lithography (DDL)

Method for performing full-chip manufacturing reliability checking and correction

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

Method and apparatus for performing model-based layout conversion for use with dipole illumination

Method and apparatus for performing dark field double dipole lithography (DDL)

Method for performing pattern pitch-split decomposition utilizing anchoring features

Method of identifying an extreme interaction pitch region, methods of designing mask patterns and manufacturing masks, device manufacturing methods and computer programs

Method of performing multiple stage model calibration for optical imaging simulation models

CPL mask and a method and program product for generating the same

Method and apparatus for performing model-based layout conversion for use with dipole illumination

HSU DUAN-FU STEPHEN

Method and apparatus for performing model-based OPC for pattern decomposed features

Method and apparatus for performing model-based OPC for pattern decomposed features

Method and apparatus for performing model-based OPC for pattern decomposed features

Lithographic processing method, and device manufactured thereby

Method and apparatus for performing dark field double dipole lithography (DDL)

Lithographic processing method, and device manufactured thereby

CHEN JANG FUNG

Method, program product and apparatus for performing mask feature pitch decomposition for use in a multiple exposure process

Method, program product and apparatus for performing double exposure lithography

Method, program product and apparatus for performing double exposure lithography

LI XIAOYANG

Multiple patterning lithography using spacer and self-aligned assist patterns

ASML HOLDING NV

Optimization using a non-uniform illumination intensity profile