Inventor
YASUI NAOKI
JP39 patents
⚠️ This page may combine multiple inventors who share the name “YASUI NAOKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
26 patentsUS7373899B2May 20, 2008
Plasma processing apparatus using active matching
HITACHI HIGH TECH CORP46 citations96
US7169255B2Jan 30, 2007
Plasma processing apparatus
HITACHI HIGH TECH CORP30 citations93
US7029594B2Apr 18, 2006
Plasma processing method
HITACHI HIGH TECH CORP19 citations93
US9336999B2May 10, 2016
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP7 citations84
US7615132B2Nov 10, 2009
Plasma processing apparatus having high frequency power source with sag compensation function and plasma processing method
HITACHI HIGH TECH CORP16 citations84
US11978612B2May 7, 2024
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations75
US11424105B2Aug 23, 2022
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations73
US10665516B2May 26, 2020
Etching method and plasma processing apparatus
HITACHI HIGH TECH CORP3 citations72
US10460913B2Oct 29, 2019
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP3 citations71
US9741579B2Aug 22, 2017
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP5 citations71
US9502217B2Nov 22, 2016
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP3 citations71
US8992724B2Mar 31, 2015
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP5 citations71
US10217613B2Feb 26, 2019
Plasma processing apparatus
HITACHI HIGH TECH CORP3 citations69
US12444572B2Oct 14, 2025
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations62
US11355315B2Jun 7, 2022
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations62
US11094512B2Aug 17, 2021
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations62
US11081320B2Aug 3, 2021
Plasma processing apparatus, plasma processing method, and ECR height monitor
HITACHI HIGH TECH CORP1 citations62
US11004658B2May 11, 2021
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations62
US10699884B2Jun 30, 2020
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations62
US12094687B2Sep 17, 2024
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP1 citations59
US10192718B2Jan 29, 2019
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US7807581B2Oct 5, 2010
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations52
US12347656B2Jul 1, 2025
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations51
US11152192B2Oct 19, 2021
Plasma processing apparatus and method
HITACHI HIGH TECH CORP0 citations51
US11417501B2Aug 16, 2022
Plasma processing apparatus and plasma processing method
HITACHI HIGH TECH CORP0 citations48
US10037868B2Jul 31, 2018
Plasma processing apparatus
HITACHI HIGH TECH CORP0 citations41
ASAHI OPTICAL CO LTD
6 patentsUS5725477AMar 10, 1998
Front end structure of endoscope
ASAHI OPTICAL CO LTD236 citations99
US5725474AMar 10, 1998
Front end structure of endoscope
ASAHI OPTICAL CO LTD180 citations99
US5725476AMar 10, 1998
Front end structure of endoscope
ASAHI OPTICAL CO LTD170 citations99
US5746695AMay 5, 1998
Front end structure of endoscope
ASAHI OPTICAL CO LTD91 citations96
US5733244AMar 31, 1998
Distal end part of endoscope
ASAHI OPTICAL CO LTD69 citations96
US5725475AMar 10, 1998
Front end structure of endoscope
ASAHI OPTICAL CO LTD52 citations92