Inventor
NAM SHIN-WOO
KR10 patents
⚠️ This page may combine multiple inventors who share the name “NAM SHIN-WOO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SEMES CO LTD
6 patentsUS11545340B2Jan 3, 2023
Apparatus for monitoring pulsed high-frequency power and substrate processing apparatus including the same
SEMES CO LTD4 citations69
US10867775B2Dec 15, 2020
Apparatus and method for treating substrate
SEMES CO LTD4 citations66
US10563919B2Feb 18, 2020
Method, system, and apparatus for controlling a temperature of a substrate in a plasma processing chamber
SEMES CO LTD1 citations56
US11195705B2Dec 7, 2021
Plasma generating unit and substrate treating apparatus comprising the same
SEMES CO LTD0 citations50
US11244847B2Feb 8, 2022
Substrate treating apparatus and substrate treating method
SEMES CO LTD0 citations47
US10319566B2Jun 11, 2019
Apparatus for supplying power and apparatus for treating substrate including the same
SEMES CO LTD0 citations37
SAMSUNG ELECTRONICS CO LTD
4 patentsUS6464794B1Oct 15, 2002
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates
SAMSUNG ELECTRONICS CO LTD75 citations94
US6437411B1Aug 20, 2002
Semiconductor device having chamfered silicide layer and method for manufacturing the same
SAMSUNG ELECTRONICS CO LTD31 citations91
US6740550B2May 25, 2004
Methods of manufacturing semiconductor devices having chamfered silicide layers therein
SAMSUNG ELECTRONICS CO LTD12 citations72
US6797109B2Sep 28, 2004
Process chamber used in manufacture of semiconductor device, capable of reducing contamination by particulates
SAMSUNG ELECTRONICS CO LTD7 citations71