Inventor
TIAN KEHAN
CN56 patents
⚠️ This page may combine multiple inventors who share the name “TIAN KEHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD
21 patentsUS12124069B1Oct 22, 2024
Optical waveguide and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD2 citations73
US11988861B1May 21, 2024
Diffractive optical waveguide and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD3 citations72
US11874488B1Jan 16, 2024
Diffractive optical waveguide and display apparatus having same
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD5 citations72
US11846785B1Dec 19, 2023
Diffraction optical waveguide and grating structure thereof, and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD2 citations71
US11796747B2Oct 24, 2023
Diffractive optical waveguide and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD2 citations71
US11988838B2May 21, 2024
Diffractive optical waveguide and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD2 citations68
US12111474B2Oct 8, 2024
Grating structure, diffraction optical waveguide, and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD1 citations61
US11774767B1Oct 3, 2023
Diffractive optical waveguide and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD1 citations59
US11668928B2Jun 6, 2023
Diffractive optical element capable of being used for projecting oblique line, projection apparatus, and design method therefor
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations56
US12461367B2Nov 4, 2025
Near-eye display waveguide device and near-eye display apparatus
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations51
US12436385B2Oct 7, 2025
Diffractive optical waveguide, design method for diffractive optical waveguide, and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations51
US11966060B1Apr 23, 2024
Optical waveguide device for display and display device having the same
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations51
US11841523B2Dec 12, 2023
Diffractive optical waveguide and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations51
US12265217B2Apr 1, 2025
Display device and glasses
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations50
US12228729B2Feb 18, 2025
Method for designing diffractive optical element and partitioned uniform light illumination system
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations50
US12085762B2Sep 10, 2024
Optical waveguide device for image display and display device having the same
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations50
US11940653B2Mar 26, 2024
Diffractive optical waveguide and display device having the same
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations50
US11899203B1Feb 13, 2024
Method for out-coupling grating for AR optical waveguide, and design method for AR optical waveguide
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations50
US11892682B2Feb 6, 2024
Diffractive optical waveguide and display device having the same preliminary class
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations50
US11693253B2Jul 4, 2023
Method for designing diffraction suppression optical component, display screen and under-screen camera apparatus
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations50
US11874503B1Jan 16, 2024
Diffractive optical waveguide and display device
JIAXING UPHOTON OPTOELECTRONICS TECH CO LTD0 citations49
IBM
16 patentsUS9651856B2May 16, 2017
Source, target and mask optimization by incorporating contour based assessments and integration over process variations
IBM5 citations84
US8372565B2Feb 12, 2013
Method for optimizing source and mask to control line width roughness and image log slope
IBM12 citations84
US11036126B2Jun 15, 2021
Semiconductor fabrication design rule loophole checking for design for manufacturability optimization
IBM4 citations73
US10585346B2Mar 10, 2020
Semiconductor fabrication design rule loophole checking for design for manufacturability optimization
IBM3 citations73
US10394116B2Aug 27, 2019
Semiconductor fabrication design rule loophole checking for design for manufacturability optimization
IBM2 citations73
US8954898B2Feb 10, 2015
Source-mask optimization for a lithography process
IBM5 citations73
US8351037B2Jan 8, 2013
Method to match exposure tools using a programmable illuminator
IBM5 citations73
US8028254B2Sep 27, 2011
Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scale
IBM7 citations73
US9250535B2Feb 2, 2016
Source, target and mask optimization by incorporating countour based assessments and integration over process variations
IBM2 citations63
US8959462B2Feb 17, 2015
Mask design method, program, and mask design system
IBM2 citations63
US7969554B2Jun 28, 2011
Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images
IBM4 citations62
US7944545B2May 17, 2011
High contrast lithographic masks
IBM4 citations62
US9857676B2Jan 2, 2018
Method and program product for designing source and mask for lithography
IBM0 citations52
US9741722B2Aug 22, 2017
Dummy gate structure for electrical isolation of a fin DRAM
IBM0 citations52
US9564445B2Feb 7, 2017
Dummy gate structure for electrical isolation of a fin DRAM
IBM0 citations52
US8056023B2Nov 8, 2011
Determining manufacturability of lithographic mask by reducing target edge pairs used in determining a manufacturing penalty of the lithographic mask
IBM1 citations49
BAGHERI SAEED
4 patentsUS8495528B2Jul 23, 2013
Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic process
BAGHERI SAEED6 citations73
US8682634B2Mar 25, 2014
Analyzing a patterning process using a model of yield
BAGHERI SAEED5 citations72
US8880382B2Nov 4, 2014
Analyzing a patterning process using a model of yield
BAGHERI SAEED3 citations62
US8234603B2Jul 31, 2012
Method for fast estimation of lithographic binding patterns in an integrated circuit layout
BAGHERI SAEED3 citations61
LIU YING
2 patentsINOUE TADANOBU
2 patentsUS8539390B2Sep 17, 2013
Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge
INOUE TADANOBU3 citations61
US8453076B2May 28, 2013
Wavefront engineering of mask data for semiconductor device design
INOUE TADANOBU2 citations61
GLOBALFOUNDRIES INC
1 patentTIRAPU-AZPIROZ JAIONE
1 patentGIL DARIO
1 patentHANGZHOU UPHOTON OPTOELECTRONICS TECH CO LTD
1 patentJIANG JING
1 patentShowing the top 50 of 56 patents by PatentIndex Score.