Inventor

LAW KAM S

US58 patents

⚠️ This page may combine multiple inventors who share the name “LAW KAM S”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAW KAM S

APPLIED MATERIALS INC

Deposition of film layers by alternately pulsing a precursor and high frequency power in a continuous gas flow

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Method and apparatus for protection of conductive surfaces in a plasma processing reactor

Plasma-enhanced CVD process using TEOS for depositing silicon oxide

Thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Thermal CVD/PECVD reactor and use for thermal chemical vapor deposition of silicon dioxide and in-situ multi-step planarized process

Process for PECVD of silicon oxide using TEOS decomposition

CVD of silicon oxide using TEOS decomposition and in-situ planarization process

Reactor chamber self-cleaning process

Multiple frequency plasma chamber with grounding capacitor at cathode

Selectively etching silicon using fluorine without plasma

Process for PECVD of silicon oxide using TEOS decomposition

Method for protecting against deposition on a selected region of a substrate

Apparatus for preventing deposition gases from contacting a selected region of a substrate during deposition processing

Plasma CVD of silicon nitride thin films on large area glass substrates at high deposition rates

Method for planarizing an integrated circuit structure using low melting inorganic material

Method for multilayer CVD processing in a single chamber

Method and apparatus for metallization of large area substrates

Methods to form metal lines using selective electrochemical deposition

Method for planarizing an integrated circuit structure using low melting inorganic material and flowing while depositing

Method and apparatus for electrostatically maintaining substrate flatness

Fluorine process for cleaning semiconductor process chamber

On-site cleaning gas generation for process chamber cleaning

Apparatus for electrostatically maintaining subtrate flatness

Deposition of TEOS oxide using pulsed RF plasma

Method for depositing amorphous silicon thin films onto large area glass substrates by chemical vapor deposition at high deposition rates

Multi-step chemical vapor deposition method for thin film transistors

Method for plasma etching a dielectric layer

Plasma display panel with a low k dielectric layer

Method for planarizing an integrated circuit structure using low melting inorganic material and flowing while depositing

APPLIED KOMATSU TECHNOLOGY INC

Surface-treated shower head for use in a substrate processing chamber

Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology

Deposition chamber cleaning technique using a high power remote excitation source

Modular substrate processing system

Film deposition using a finger type shadow frame

Dual frequency excitation of plasma for film deposition

Surface-treated shower head for use in a substrate processing chamber

High-rate dry-etch of indium and tin oxides by hydrogen and halogen radicals such as derived from HCl gas

Method and apparatus for electrostatically maintaining substrate flatness

Tapered dielectric etch in semiconductor devices

Tapered profile etching method

Dry-etch of indium and tin oxides with C2H5I gas

Method and apparatus for etching film layers on large substrates

Apparatus and method for white powder reduction in silicon nitride deposition using remote plasma source cleaning technology

High power microwave plasma applicator

Multi-step chemical vapor deposition method for thin film transistors

MAK CECILIA Y

Method for depositing porous films

Method for depositing porous films

BLONIGAN WENDELL THOMAS

Auto-sequencing multi-directional inline processing apparatus

APPLIED TECHNOLOGY INC

Annealing an amorphous film using microwave energy