Inventor
HIRAIWA HIROYUKI
JP29 patents
⚠️ This page may combine multiple inventors who share the name “HIRAIWA HIROYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
25 patentsUS6583931B2Jun 24, 2003
Projection optical system, production method thereof, and projection exposure apparatus using it
NIKON CORP83 citations97
US6366404B1Apr 2, 2002
Projection optical system, production method thereof, and projection exposure apparatus using it
NIKON CORP93 citations97
US5719698AFeb 17, 1998
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP30 citations96
US5707908AJan 13, 1998
Silica glass
NIKON CORP64 citations96
US5679125AOct 21, 1997
Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
NIKON CORP59 citations96
US6769273B1Aug 3, 2004
Method of manufacturing silica glass member and silica glass member obtained by the method
NIKON CORP53 citations92
US6672109B1Jan 6, 2004
Silica glass member, method for producing the same, and projection aligners using the same
NIKON CORP38 citations92
US6189339B1Feb 20, 2001
Method for producing silica glass used for photolithography
NIKON CORP33 citations92
US6108126AAug 22, 2000
Illuminating apparatus
NIKON CORP25 citations92
US6087283AJul 11, 2000
Silica glass for photolithography
NIKON CORP39 citations92
US5958809ASep 28, 1999
Fluorine-containing silica glass
NIKON CORP47 citations92
US5908482AJun 1, 1999
Method for producing a silica glass
NIKON CORP41 citations92
US5702495ADec 30, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP29 citations92
US5699183ADec 16, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP25 citations92
US5696624ADec 9, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP24 citations92
US5776219AJul 7, 1998
Method of making a piece of glass for measuring transmittance
NIKON CORP22 citations91
US5703712ADec 30, 1997
Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production
NIKON CORP11 citations82
US6518210B1Feb 11, 2003
Exposure apparatus including silica glass and method for producing silica glass
NIKON CORP10 citations74
US6116260ASep 12, 2000
Liquid material supplying apparatus and liquid material supplying method
NIKON CORP12 citations74
US6181469B1Jan 30, 2001
Optical member for photolithography, method for evaluating optical member, and photolithography apparatus
NIKON CORP7 citations73
US6025955AFeb 15, 2000
Optical member for photolithography, method for evaluating optical member, and photolithography apparatus
NIKON CORP13 citations73
US6994747B2Feb 7, 2006
Method for producing optical member
NIKON CORP9 citations70
US6732546B1May 11, 2004
Product method of synthetic silica glass and thermal treatment apparatus
NIKON CORP9 citations69
US6829039B2Dec 7, 2004
Optical member for photolithography and method of evaluating the same
NIKON CORP4 citations62
US6129987AOct 10, 2000
Method of making a piece of glass for measuring transmittance
NIKON CORP2 citations61