P

Inventor

MIYAMOTO TAKAAKI

JP31 patents
⚠️ This page may combine multiple inventors who share the name “MIYAMOTO TAKAAKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SONY CORP

30 patents
US6380065B1Apr 30, 2002

Interconnection structure and fabrication process therefor

SONY CORP69 citations96
US5831335ANov 3, 1998

Semiconductor device contains refractory metal or metal silicide with less than 1% weight of halogen atom

SONY CORP67 citations96
US5747384AMay 5, 1998

Process of forming a refractory metal thin film

SONY CORP61 citations96
US6143377ANov 7, 2000

Process of forming a refractory metal thin film

SONY CORP17 citations92
US6114764ASep 5, 2000

Semiconductor device and process for fabricating the same

SONY CORP19 citations92
US6040021AMar 21, 2000

Plasma CVD process for metal films and metal nitride films

SONY CORP51 citations92
US7470004B2Dec 30, 2008

Liquid ejection head and liquid ejection device

SONY CORP16 citations84
US6536877B2Mar 25, 2003

Printer, printer head, and method for fabricating printer head formed with a multilayer wiring pattern

SONY CORP18 citations84
US6331485B1Dec 18, 2001

Method of producing semiconductor device

SONY CORP17 citations84
US6284649B1Sep 4, 2001

Chemical vapor phase growing method of a metal nitride film and a method of manufacturing an electronic device using the same

SONY CORP18 citations84
US5981388ANov 9, 1999

Plasma CVD method for forming a semiconductor device having metal film formed thereby

SONY CORP17 citations84
US6685304B2Feb 3, 2004

Printer, printer head and method of producing the print head to promote reliable bonding of print head structures

SONY CORP8 citations74
US6337515B1Jan 8, 2002

Wiring structure in semiconductor device and method for forming the same

SONY CORP6 citations74
US5840628ANov 24, 1998

Plasma CVD method for depositing tin layer

SONY CORP15 citations74
US7028402B2Apr 18, 2006

Method of manufacturing a liquid dispenser

SONY CORP6 citations73
US5962084AOct 5, 1999

Plasma CVD process and semiconductor device having metal film formed by the process

SONY CORP11 citations73
US7690768B2Apr 6, 2010

Liquid ejecting head and liquid ejecting apparatus

SONY CORP6 citations63
US7537311B2May 26, 2009

Method and apparatus for ejecting liquid

SONY CORP3 citations63
US7410247B2Aug 12, 2008

Liquid ejection head and liquid ejection apparatus

SONY CORP3 citations63
US7334878B2Feb 26, 2008

Liquid ejection head and liquid ejection apparatus

SONY CORP3 citations63
US6624062B2Sep 23, 2003

Wiring structure in semiconductor device and method for forming the same

SONY CORP2 citations63
US6592209B2Jul 15, 2003

Printer, printer head, and method of producing the printer head

SONY CORP2 citations62
US7261393B2Aug 28, 2007

Liquid jetting head, liquid jetting apparatus, and method of manufacturing the liquid jetting head

SONY CORP2 citations61
US6773091B2Aug 10, 2004

Liquid discharge device and method of manufacturing the same

SONY CORP3 citations61
US7836598B2Nov 23, 2010

Method of manufacturing a thermal liquid jet head using an etching process

SONY CORP0 citations52
US7431430B2Oct 7, 2008

Liquid ejecting head having selectively controlled heat-energy evolving element regions

SONY CORP1 citations52
US7182440B2Feb 27, 2007

Liquid jet apparatus

SONY CORP0 citations52
US7066571B2Jun 27, 2006

Liquid ejection apparatus

SONY CORP0 citations52
US6513912B2Feb 4, 2003

Heat generating element for printer head and manufacturing method therefor

SONY CORP0 citations52
US6848770B2Feb 1, 2005

Liquid dispenser and printer

SONY CORP0 citations51

RIKEN

1 patent