Inventor
SAKAKIBARA MAKOTO
JP37 patents
⚠️ This page may combine multiple inventors who share the name “SAKAKIBARA MAKOTO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
22 patentsUS7425714B2Sep 16, 2008
Measurement method of electron beam current, electron beam writing system and electron beam detector
HITACHI HIGH TECH CORP12 citations84
US11011348B2May 18, 2021
Scanning electron microscope and sample observation method using scanning electron microscope
HITACHI HIGH TECH CORP8 citations83
US11257658B2Feb 22, 2022
Charged particle beam apparatus
HITACHI HIGH TECH CORP3 citations73
US7423274B2Sep 9, 2008
Electron beam writing system and electron beam writing method
HITACHI HIGH TECH CORP7 citations73
US9520266B2Dec 13, 2016
Pattern critical dimension measurement equipment and method for measuring pattern critical dimension
HITACHI HIGH TECH CORP4 citations72
US12394586B2Aug 19, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US12205790B2Jan 21, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US12176181B2Dec 24, 2024
Pattern inspecting device
HITACHI HIGH TECH CORP1 citations62
US12125667B2Oct 22, 2024
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US12057288B2Aug 6, 2024
Charged particle beam device and inspection method
HITACHI HIGH TECH CORP0 citations62
US11227740B2Jan 18, 2022
Electron gun and electron beam application device
HITACHI HIGH TECH CORP0 citations62
US11170969B2Nov 9, 2021
Electron beam observation device, electron beam observation system, and control method of electron beam observation device
HITACHI HIGH TECH CORP0 citations61
US11967482B2Apr 23, 2024
Charged particle beam device
HITACHI HIGH TECH CORP0 citations52
US9287082B2Mar 15, 2016
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations52
US12196802B2Jan 14, 2025
Semiconductor inspection device and method for inspecting semiconductor sample
HITACHI HIGH TECH CORP0 citations51
US11791130B2Oct 17, 2023
Electron beam observation device, electron beam observation system, and image correcting method and method for calculating correction factor for image correction in electron beam observation device
HITACHI HIGH TECH CORP0 citations50
US11282671B2Mar 22, 2022
Charged-particle beam apparatus
HITACHI HIGH TECH CORP0 citations50
US12512294B2Dec 30, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations45
US10707047B2Jul 7, 2020
Measuring device and measuring method
HITACHI HIGH TECH CORP0 citations41
US10636618B2Apr 28, 2020
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations41
US10217604B2Feb 26, 2019
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations41
US10014160B2Jul 3, 2018
Scanning electron microscope and method for controlling same
HITACHI HIGH TECH CORP0 citations40
HITACHI LTD
6 patentsUS9966225B2May 8, 2018
Charged particle beam device, simulation method, and simulation device
HITACHI LTD5 citations73
US10755396B2Aug 25, 2020
Image forming apparatus
HITACHI LTD1 citations62
US10319562B2Jun 11, 2019
Charged particle beam device
HITACHI LTD0 citations51
US10361063B2Jul 23, 2019
Charged particle detector and charged particle beam device using the same
HITACHI LTD0 citations50
US11380518B2Jul 5, 2022
Measurement system and method for setting observation conditions of measurement apparatus
HITACHI LTD0 citations47
US10825649B2Nov 3, 2020
Electron beam device
HITACHI LTD0 citations41
KAO CORP
4 patentsUS6730780B2May 4, 2004
Water-based ink
KAO CORP7 citations73
US7112619B2Sep 26, 2006
Water-based ink
KAO CORP2 citations61
US11685705B2Jun 27, 2023
Method for producing α-allylated cycloalkanone
KAO CORP0 citations49
US11524929B2Dec 13, 2022
Method for producing alpha-allylated cycloalkanone
KAO CORP0 citations49