Inventor
OHTA HIROYA
JP47 patents
⚠️ This page may combine multiple inventors who share the name “OHTA HIROYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI HIGH TECH CORP
22 patentsUS8350214B2Jan 8, 2013
Charged particle beam applied apparatus
HITACHI HIGH TECH CORP88 citations94
US7880143B2Feb 1, 2011
Electron beam apparatus
HITACHI HIGH TECH CORP54 citations94
US7906761B2Mar 15, 2011
Charged particle beam apparatus
HITACHI HIGH TECH CORP16 citations92
US7425714B2Sep 16, 2008
Measurement method of electron beam current, electron beam writing system and electron beam detector
HITACHI HIGH TECH CORP12 citations84
US7230252B2Jun 12, 2007
Aberration adjusting method, device fabrication method, and charged particle beam lithography machine
HITACHI HIGH TECH CORP10 citations84
US6946665B2Sep 20, 2005
Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus
HITACHI HIGH TECH CORP18 citations84
US7005659B2Feb 28, 2006
Charged particle beam exposure apparatus, charged particle beam exposure method, and device manufacturing method using the same apparatus
HITACHI HIGH TECH CORP8 citations74
US7423274B2Sep 9, 2008
Electron beam writing system and electron beam writing method
HITACHI HIGH TECH CORP7 citations73
US6809319B2Oct 26, 2004
Electron beam writing equipment and electron beam writing method
HITACHI HIGH TECH CORP8 citations73
US11353798B2Jun 7, 2022
Pattern measurement device and pattern measurement method
HITACHI HIGH TECH CORP2 citations71
US10816332B2Oct 27, 2020
Pattern measurement device and pattern measurement method
HITACHI HIGH TECH CORP3 citations71
US7189979B2Mar 13, 2007
Electron gun
HITACHI HIGH TECH CORP5 citations63
US6992307B2Jan 31, 2006
Electron beam source and electron beam exposure apparatus employing the electron beam source
HITACHI HIGH TECH CORP3 citations63
US12400383B2Aug 26, 2025
Training method for learning apparatus, and image generation system
HITACHI HIGH TECH CORP0 citations62
US12205790B2Jan 21, 2025
Charged particle beam device
HITACHI HIGH TECH CORP0 citations62
US6838682B2Jan 4, 2005
Electron beam exposure equipment and electron beam exposure method
HITACHI HIGH TECH CORP4 citations62
US12174551B2Dec 24, 2024
Pattern measurement device and pattern measurement method
HITACHI HIGH TECH CORP0 citations61
US11435178B2Sep 6, 2022
Calibration sample, electron beam adjustment method and electron beam apparatus using same
HITACHI HIGH TECH CORP0 citations61
US12525430B2Jan 13, 2026
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations58
US11869745B2Jan 9, 2024
Charged particle beam device
HITACHI HIGH TECH CORP0 citations51
US10629408B2Apr 21, 2020
Charged particle beam device
HITACHI HIGH TECH CORP0 citations48
US10636618B2Apr 28, 2020
Charged particle beam apparatus
HITACHI HIGH TECH CORP0 citations41
HITACHI LTD
12 patentsUS6159644ADec 12, 2000
Method of fabricating semiconductor circuit devices utilizing multiple exposures
HITACHI LTD100 citations98
US6667486B2Dec 23, 2003
Electron beam exposure method, electron beam exposure apparatus and device manufacturing method using the same
HITACHI LTD34 citations92
US6511048B1Jan 28, 2003
Electron beam lithography apparatus and pattern forming method
HITACHI LTD20 citations92
US6768118B2Jul 27, 2004
Electron beam monitoring sensor and electron beam monitoring method
HITACHI LTD8 citations74
US9966225B2May 8, 2018
Charged particle beam device, simulation method, and simulation device
HITACHI LTD5 citations73
US9508611B2Nov 29, 2016
Semiconductor inspection method, semiconductor inspection device and manufacturing method of semiconductor element
HITACHI LTD3 citations71
US5326979AJul 5, 1994
Electron beam lithography system
HITACHI LTD4 citations61
US8022365B2Sep 20, 2011
Charged particle beam equipments, and charged particle beam microscope
HITACHI LTD1 citations52
US7863565B2Jan 4, 2011
Electron beam inspection method and electron beam inspection apparatus
HITACHI LTD1 citations52
US10262830B2Apr 16, 2019
Scanning electron microscope and electron trajectory adjustment method therefor
HITACHI LTD0 citations41
US9991088B2Jun 5, 2018
Charged particle beam device and aberration corrector
HITACHI LTD0 citations41
US9846133B2Dec 19, 2017
Semiconductor inspection device including a counter electrode with adjustable potentials used to obtain images for detection of defects, and inspection method using charged particle beam
HITACHI LTD0 citations41
CANON KK
5 patentsUS6870171B2Mar 22, 2005
Exposure apparatus
CANON KK32 citations92
US6784442B2Aug 31, 2004
Exposure apparatus, control method thereof, and device manufacturing method
CANON KK23 citations92
US7378671B2May 27, 2008
Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus
CANON KK6 citations63
US7049607B2May 23, 2006
Electron beam writing equipment and electron beam writing method
CANON KK2 citations62
US6870310B2Mar 22, 2005
Multibeam generating apparatus and electron beam drawing apparatus
CANON KK5 citations62