Inventor

HO NIEN-TING

TW39 patents

⚠️ This page may combine multiple inventors who share the name “HO NIEN-TING”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HO NIEN-TING

UNITED MICROELECTRONICS CORP

Semiconductor process of forming metal gates with different threshold voltages and semiconductor structure thereof

Metal gate structure and method of forming the same

Semiconductor structure having a metal gate with side wall spacers

Method for modulating work function of semiconductor device having metal gate structure by gas treatment

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Semiconductor device and method for fabricating the same

Method for forming a thin film resistor with improved thermal stability

Method for fabricating semiconductor device

Field effect transistor and fabrication method thereof

ReRAM structure and method of fabricating the same

ReRAM structure and method of fabricating the same

Semiconductor device and manufacturing method thereof

Semiconductor device and manufacturing method thereof

Manufacturing method of metal gate structure

Structure of metal gate structure and manufacturing method of the same

Semiconductor device

Method for fabricating metal silicide

Method for fabricating MOS transistors

Semiconductor device and method for fabricating the same

Semiconductor structure and method for manufacturing the same

Metal gate forming process

Semiconductor device and method for fabricating the same

Method for fabricating semiconductor device

Method for fabricating MOS transistor

Semiconductor device and method for fabricating the same

Method of removing particles from wafer

Method of manufacturing semiconductor device having gate metal

Method for tuning metal gate work function before contact formation in fin-shaped field effect transistor manufacturing process

CHEN YI-WEI

Semiconductor structure having a metal gate with side wall spacers

Method of fabricating complementary metal-oxide-semiconductor (CMOS) Device

Semiconductor device and method of making the same

LAI KUO-CHIH

Semiconductor device with ultra thin silicide layer

Method for fabricating MOS transistor

Method of removing oxides

LIN CHIN-FU

Metal gate structure

HUANG CHIEN-CHUNG

Fabricating method of semiconductor elements

HSU CHIA-CHANG

Salicide process