Inventor
SHIN JAW-JUNG
TW43 patents
⚠️ This page may combine multiple inventors who share the name “SHIN JAW-JUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TAIWAN SEMICONDUCTOR MFG
26 patentsUS7252909B2Aug 7, 2007
Method to reduce CD non-uniformity in IC manufacturing
TAIWAN SEMICONDUCTOR MFG199 citations99
US8822106B2Sep 2, 2014
Grid refinement method
TAIWAN SEMICONDUCTOR MFG31 citations96
US7266803B2Sep 4, 2007
Layout generation and optimization to improve photolithographic performance
TAIWAN SEMICONDUCTOR MFG82 citations96
US8846278B2Sep 30, 2014
Electron beam lithography system and method for improving throughput
TAIWAN SEMICONDUCTOR MFG26 citations93
US8828632B2Sep 9, 2014
Multiple-grid exposure method
TAIWAN SEMICONDUCTOR MFG26 citations93
US7234128B2Jun 19, 2007
Method for improving the critical dimension uniformity of patterned features on wafers
TAIWAN SEMICONDUCTOR MFG21 citations92
US6774044B2Aug 10, 2004
Reducing photoresist shrinkage via plasma treatment
TAIWAN SEMICONDUCTOR MFG19 citations89
US8972908B2Mar 3, 2015
Method for electron beam proximity correction with improved critical dimension accuracy
TAIWAN SEMICONDUCTOR MFG10 citations84
US8822107B2Sep 2, 2014
Grid refinement method
TAIWAN SEMICONDUCTOR MFG5 citations84
US7934177B2Apr 26, 2011
Method and system for a pattern layout split
TAIWAN SEMICONDUCTOR MFG19 citations83
US6973636B2Dec 6, 2005
Method of defining forbidden pitches for a lithography exposure tool
TAIWAN SEMICONDUCTOR MFG12 citations82
US9329488B2May 3, 2016
Grid refinement method
TAIWAN SEMICONDUCTOR MFG2 citations63
US9176389B2Nov 3, 2015
Grid refinement method
TAIWAN SEMICONDUCTOR MFG2 citations63
US8610083B2Dec 17, 2013
Systems and methods providing electron beam writing to a medium
TAIWAN SEMICONDUCTOR MFG1 citations63
US8368037B2Feb 5, 2013
Systems and methods providing electron beam writing to a medium
TAIWAN SEMICONDUCTOR MFG4 citations63
US7057299B2Jun 6, 2006
Alignment mark configuration
TAIWAN SEMICONDUCTOR MFG2 citations63
US9390891B2Jul 12, 2016
Apparatus for charged particle lithography system
TAIWAN SEMICONDUCTOR MFG2 citations62
US7643976B2Jan 5, 2010
Method and system for identifying lens aberration sensitive patterns in an integrated circuit chip
TAIWAN SEMICONDUCTOR MFG6 citations61
US6861179B1Mar 1, 2005
Charge effect and electrostatic damage prevention method on photo-mask
TAIWAN SEMICONDUCTOR MFG4 citations61
US9291913B2Mar 22, 2016
Pattern generator for a lithography system
TAIWAN SEMICONDUCTOR MFG0 citations52
US9229332B2Jan 5, 2016
Systems and methods for high-throughput and small-footprint scanning exposure for lithography
TAIWAN SEMICONDUCTOR MFG0 citations52
US8927947B2Jan 6, 2015
Systems and methods providing electron beam writing to a medium
TAIWAN SEMICONDUCTOR MFG0 citations52
US8852849B2Oct 7, 2014
Electron beam lithography system and method for improving throughput
TAIWAN SEMICONDUCTOR MFG0 citations52
US7175941B2Feb 13, 2007
Phase shift assignments for alternate PSM
TAIWAN SEMICONDUCTOR MFG0 citations51
US8984452B2Mar 17, 2015
Long-range lithographic dose correction
TAIWAN SEMICONDUCTOR MFG0 citations42
US9147377B2Sep 29, 2015
Method for image dithering for lithographic processes
TAIWAN SEMICONDUCTOR MFG0 citations36
TAIWAN SEMICONDUCTOR MFG CO LTD
8 patentsUS9810994B2Nov 7, 2017
Systems and methods for high-throughput and small-footprint scanning exposure for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD8 citations84
US9538628B1Jan 3, 2017
Method for EUV power improvement with fuel droplet trajectory stabilization
TAIWAN SEMICONDUCTOR MFG CO LTD2 citations73
US11670541B2Jun 6, 2023
Methods of manufacturing semiconductor device using phase shift mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US11189521B2Nov 30, 2021
Methods of manufacturing redistribution circuit structures using phase shift mask
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations62
US9911575B2Mar 6, 2018
Apparatus for charged particle lithography system
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9678434B2Jun 13, 2017
Grid refinement method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9529271B2Dec 27, 2016
Grid refinement method
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52
US9519225B2Dec 13, 2016
Systems and methods for high-throughput and small-footprint scanning exposure for lithography
TAIWAN SEMICONDUCTOR MFG CO LTD0 citations52