Inventor

SMYTHE III JOHN A

US37 patents

⚠️ This page may combine multiple inventors who share the name “SMYTHE III JOHN A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SMYTHE III JOHN A

MICRON TECHNOLOGY INC

Low temperature process for polysilazane oxidation/densification

Methods for forming shallow trench isolation

Sub-micron space liner and densification process

Low temperature process for polysilazane oxidation/densification

Trench insulation structures including an oxide liner that is thinner along the walls of the trench than along the base

Liner for shallow trench isolation

Storage node after three-node access device formation for vertical three dimensional (3D) memory

Liner for shallow trench isolation

Channel conduction in semiconductor devices

Channel integration in a three-node access device for vertical three dimensional (3D) memory

Gate dielectric repair on three-node access device formation for vertical three-dimensional (3D) memory

Epitaxtal single crystalline silicon growth for a horizontal access device

Replacement gate dielectric in three-node access device formation for vertical three dimensional (3D) memory

Method of forming an isolation structure that includes forming a silicon layer at a base of the recess

Resistive RAM devices and methods

Trench isolation implantation

GCIB-treated resistive device

GCIB-treated resistive device

Resistive memory and methods of processing resistive memory

Sub-micron space liner and filler process

Epitaxial single crystalline silicon growth for a horizontal access device

Channel conduction in semiconductor devices

Formation of an atomic layer of germanium in an opening of a substrate material having a high aspect ratio

Resistive RAM devices and methods

Trench insulation structures including an oxide liner and oxidation barrier

Reduction of crystal growth resulting from annealing a conductive material

Resistive RAM devices and methods

Epitaxial single crystalline silicon growth for memory arrays

ZILOG INC

Method of fabricating a high quality thin oxide

Method of eliminating gate leakage in nitrogen annealed oxides

In-situ etch and pre-clean for high quality thin oxides

SANDHU GURTEJ S

Trench isolation implantation

Resistive memory and methods of processing resistive memory

FUCSKO JANOS

Low temperature process for polysilazane oxidation/densification

MICRON TECHNOLOGIES INC

Isolation trench

LODESTAR LICENSING GROUP LLC

Channel conduction in semiconductor devices

HU YONGJUN JEFF

Forming memory using high power impulse magnetron sputtering