Inventor
HOWELL RAFAEL C
US22 patents
⚠️ This page may combine multiple inventors who share the name “HOWELL RAFAEL C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
20 patentsUS10025201B2Jul 17, 2018
Flows of optimization for lithographic processes
ASML NETHERLANDS BV6 citations84
US11232249B2Jan 25, 2022
Method for determining curvilinear patterns for patterning device
ASML NETHERLANDS BV5 citations73
US10191384B2Jan 29, 2019
Discrete source mask optimization
ASML NETHERLANDS BV3 citations73
US11972194B2Apr 30, 2024
Method for determining patterning device pattern based on manufacturability
ASML NETHERLANDS BV2 citations71
US10990003B2Apr 27, 2021
Binarization method and freeform mask optimization flow
ASML NETHERLANDS BV6 citations71
US11586114B2Feb 21, 2023
Wavefront optimization for tuning scanner based on performance matching
ASML NETHERLANDS BV2 citations70
US11734490B2Aug 22, 2023
Method for determining curvilinear patterns for patterning device
ASML NETHERLANDS BV0 citations62
US10558124B2Feb 11, 2020
Discrete source mask optimization
ASML NETHERLANDS BV1 citations62
US12092963B2Sep 17, 2024
Method of determining characteristic of patterning process based on defect for reducing hotspot
ASML NETHERLANDS BV0 citations61
US11789371B2Oct 17, 2023
Methods of determining scattering of radiation by structures of finite thicknesses on a patterning device
ASML NETHERLANDS BV0 citations61
US11580289B2Feb 14, 2023
Method for determining patterning device pattern based on manufacturability
ASML NETHERLANDS BV1 citations61
US11409203B2Aug 9, 2022
Methods of determining scattering of radiation by structures of finite thicknesses on a patterning device
ASML NETHERLANDS BV0 citations61
US11016395B2May 25, 2021
Methods of determining scattering of radiation by structures of finite thicknesses on a patterning device
ASML NETHERLANDS BV0 citations61
US10401732B2Sep 3, 2019
Optimization flows of source, mask and projection optics
ASML NETHERLANDS BV1 citations60
US11977334B2May 7, 2024
Wavefront optimization for tuning scanner based on performance matching
ASML NETHERLANDS BV0 citations58
US12210291B2Jan 28, 2025
Aberration impact systems, models, and manufacturing processes
ASML NETHERLANDS BV0 citations57
US11506984B2Nov 22, 2022
Simulation of lithography using multiple-sampling of angular distribution of source radiation
ASML NETHERLANDS BV1 citations57
US11614690B2Mar 28, 2023
Methods of tuning process models
ASML NETHERLANDS BV1 citations55
US10459346B2Oct 29, 2019
Flows of optimization for lithographic processes
ASML NETHERLANDS BV0 citations52
US11054750B2Jul 6, 2021
Profile aware source-mask optimization
ASML NETHERLANDS BV0 citations47