Inventor
JENSEN EARL
US20 patents
⚠️ This page may combine multiple inventors who share the name “JENSEN EARL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
9 patentsUS10460966B2Oct 29, 2019
Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applications
KLA TENCOR CORP13 citations81
US9823121B2Nov 21, 2017
Method and system for measuring radiation and temperature exposure of wafers along a fabrication process line
KLA TENCOR CORP3 citations73
US9620400B2Apr 11, 2017
Position sensitive substrate device
KLA TENCOR CORP2 citations73
US9719867B2Aug 1, 2017
Method and system for measuring heat flux
KLA TENCOR CORP5 citations69
US10900843B2Jan 26, 2021
In-situ temperature sensing substrate, system, and method
KLA TENCOR CORP0 citations62
US10777393B2Sep 15, 2020
Process condition sensing device and method for plasma chamber
KLA TENCOR CORP1 citations62
US10215626B2Feb 26, 2019
Method and system for measuring radiation and temperature exposure of wafers along a fabrication process line
KLA TENCOR CORP1 citations62
US11823925B2Nov 21, 2023
Encapsulated instrumented substrate apparatus for acquiring measurement parameters in high temperature process applications
KLA TENCOR CORP0 citations59
US9305753B2Apr 5, 2016
Thickness change monitor wafer for in situ film thickness monitoring
KLA TENCOR CORP1 citations52
JENSEN EARL
5 patentsUS9356822B2May 31, 2016
Automated interface apparatus and method for use in semiconductor wafer handling systems
JENSEN EARL10 citations82
US8889021B2Nov 18, 2014
Process condition sensing device and method for plasma chamber
JENSEN EARL6 citations82
US9360302B2Jun 7, 2016
Film thickness monitor
JENSEN EARL3 citations71
US9304160B1Apr 5, 2016
Defect inspection apparatus, system, and method
JENSEN EARL4 citations70
US9140604B2Sep 22, 2015
Wafer level spectrometer
JENSEN EARL2 citations61
SENSARRAY CORP
2 patentsSUN MEI
2 patentsUS9222842B2Dec 29, 2015
High temperature sensor wafer for in-situ measurements in active plasma
SUN MEI9 citations79
US9134186B2Sep 15, 2015
Process condition measuring device (PCMD) and method for measuring process conditions in a workpiece processing tool configured to process production workpieces
SUN MEI2 citations58