Inventor
KIKKAWA Yuki
JP13 patents
Patents
13 patentsUS12195658B2Jan 14, 2025
Treatment liquid for semiconductor wafers
TOKUYAMA CORP2 citations73
US11390577B2Jul 19, 2022
Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers
TOKUYAMA CORP2 citations71
US11390829B2Jul 19, 2022
Treatment liquid for semiconductor wafers, which contains hypochlorite ions
TOKUYAMA CORP2 citations70
US12538727B2Jan 27, 2026
Treatment liquid for semiconductor with ruthenium
TOKUYAMA CORP0 citations61
US12509632B2Dec 30, 2025
Treatment liquid for semiconductors and method for producing same
TOKUYAMA CORP0 citations61
US12444617B2Oct 14, 2025
Semiconductor wafer processing liquid containing hypobromite ions and PH buffering agent
TOKUYAMA CORP0 citations61
US12247299B2Mar 11, 2025
Treatment liquid for semiconductor with ruthenium and method of producing the same
TOKUYAMA CORP0 citations61
US12247298B2Mar 11, 2025
Semiconductor wafer treatment liquid and production method thereof
TOKUYAMA CORP0 citations61
US12024663B2Jul 2, 2024
Onium salt-containing treatment liquid for semiconductor wafers
TOKUYAMA CORP0 citations61
US11674230B2Jun 13, 2023
Treatment liquid for semiconductor with ruthenium and method of producing the same
TOKUYAMA CORP0 citations61
US11572331B2Feb 7, 2023
Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers
TOKUYAMA CORP0 citations61
US11572533B2Feb 7, 2023
Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer
TOKUYAMA CORP0 citations60
US11932590B2Mar 19, 2024
Inhibitor for RuO4 gas generation and method for inhibiting RuO4 gas generation
TOKUYAMA CORP0 citations50