Inventor
SHIMODA TAKAFUMI
JP22 patents
⚠️ This page may combine multiple inventors who share the name “SHIMODA TAKAFUMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKUYAMA CORP
15 patentsUS12195658B2Jan 14, 2025
Treatment liquid for semiconductor wafers
TOKUYAMA CORP2 citations73
US11390577B2Jul 19, 2022
Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers
TOKUYAMA CORP2 citations71
US11390829B2Jul 19, 2022
Treatment liquid for semiconductor wafers, which contains hypochlorite ions
TOKUYAMA CORP2 citations70
US12466732B2Nov 11, 2025
Method for producing halogen oxyacid solution
TOKUYAMA CORP0 citations62
US12538727B2Jan 27, 2026
Treatment liquid for semiconductor with ruthenium
TOKUYAMA CORP0 citations61
US12509632B2Dec 30, 2025
Treatment liquid for semiconductors and method for producing same
TOKUYAMA CORP0 citations61
US12444617B2Oct 14, 2025
Semiconductor wafer processing liquid containing hypobromite ions and PH buffering agent
TOKUYAMA CORP0 citations61
US12247299B2Mar 11, 2025
Treatment liquid for semiconductor with ruthenium and method of producing the same
TOKUYAMA CORP0 citations61
US12247298B2Mar 11, 2025
Semiconductor wafer treatment liquid and production method thereof
TOKUYAMA CORP0 citations61
US12024663B2Jul 2, 2024
Onium salt-containing treatment liquid for semiconductor wafers
TOKUYAMA CORP0 citations61
US11674230B2Jun 13, 2023
Treatment liquid for semiconductor with ruthenium and method of producing the same
TOKUYAMA CORP0 citations61
US11572331B2Feb 7, 2023
Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers
TOKUYAMA CORP0 citations61
US11572533B2Feb 7, 2023
Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer
TOKUYAMA CORP0 citations60
US11738997B2Aug 29, 2023
Method and apparatus for producing halogen oxyacid solution
TOKUYAMA CORP0 citations59
US11932590B2Mar 19, 2024
Inhibitor for RuO4 gas generation and method for inhibiting RuO4 gas generation
TOKUYAMA CORP0 citations50
ISHIDA SEISAKUSHO
6 patentsUS11208222B2Dec 28, 2021
Bag-making and packaging machine
ISHIDA SEISAKUSHO2 citations72
US11052628B2Jul 6, 2021
Bag making and packaging machine
ISHIDA SEISAKUSHO2 citations72
US11046468B2Jun 29, 2021
Bag-making and packaging machine
ISHIDA SEISAKUSHO2 citations71
US11427365B2Aug 30, 2022
Bag-making and packaging machine
ISHIDA SEISAKUSHO3 citations70
US10589885B2Mar 17, 2020
Film roll support device
ISHIDA SEISAKUSHO1 citations60
US9434494B2Sep 6, 2016
Bag making and packaging machine
ISHIDA SEISAKUSHO0 citations41