P

Inventor

NEGISHI TAKAYUKI

JP19 patents
⚠️ This page may combine multiple inventors who share the name “NEGISHI TAKAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKUYAMA CORP

15 patents
US12195658B2Jan 14, 2025

Treatment liquid for semiconductor wafers

TOKUYAMA CORP2 citations73
US11390577B2Jul 19, 2022

Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers

TOKUYAMA CORP2 citations71
US11390829B2Jul 19, 2022

Treatment liquid for semiconductor wafers, which contains hypochlorite ions

TOKUYAMA CORP2 citations70
US12466732B2Nov 11, 2025

Method for producing halogen oxyacid solution

TOKUYAMA CORP0 citations62
US12538727B2Jan 27, 2026

Treatment liquid for semiconductor with ruthenium

TOKUYAMA CORP0 citations61
US12509632B2Dec 30, 2025

Treatment liquid for semiconductors and method for producing same

TOKUYAMA CORP0 citations61
US12444617B2Oct 14, 2025

Semiconductor wafer processing liquid containing hypobromite ions and PH buffering agent

TOKUYAMA CORP0 citations61
US12247299B2Mar 11, 2025

Treatment liquid for semiconductor with ruthenium and method of producing the same

TOKUYAMA CORP0 citations61
US12247298B2Mar 11, 2025

Semiconductor wafer treatment liquid and production method thereof

TOKUYAMA CORP0 citations61
US12024663B2Jul 2, 2024

Onium salt-containing treatment liquid for semiconductor wafers

TOKUYAMA CORP0 citations61
US11674230B2Jun 13, 2023

Treatment liquid for semiconductor with ruthenium and method of producing the same

TOKUYAMA CORP0 citations61
US11572331B2Feb 7, 2023

Quaternary alkyl ammonium hypochlorite solution, method of producing the same, and method for processing semiconductor wafers

TOKUYAMA CORP0 citations61
US11572533B2Feb 7, 2023

Quaternary alkylammonium hypochlorite solution, method for manufacturing same, and method for cleaning semiconductor wafer

TOKUYAMA CORP0 citations60
US11738997B2Aug 29, 2023

Method and apparatus for producing halogen oxyacid solution

TOKUYAMA CORP0 citations59
US11932590B2Mar 19, 2024

Inhibitor for RuO4 gas generation and method for inhibiting RuO4 gas generation

TOKUYAMA CORP0 citations50

PIONEER CORP

2 patents

SONY GROUP CORP

1 patent

CLARION CO LTD

1 patent