P

Inventor

OHMI TADAHIRO

JP601 patents
⚠️ This page may combine multiple inventors who share the name “OHMI TADAHIRO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

OHMI TADAHIRO

13 patents
US6446573B2Sep 10, 2002

Plasma process device

OHMI TADAHIRO572 citations99
US5272417ADec 21, 1993

Device for plasma process

OHMI TADAHIRO287 citations99
US6585851B1Jul 1, 2003

Plasma etching device

OHMI TADAHIRO178 citations98
US6257270B1Jul 10, 2001

Fluid control device

OHMI TADAHIRO91 citations98
US6035893AMar 14, 2000

Shutoff-opening devices and fluid control apparatus comprising such devices

OHMI TADAHIRO143 citations98
US8114245B2Feb 14, 2012

Plasma etching device

OHMI TADAHIRO157 citations97
US6357385B1Mar 19, 2002

Plasma device

OHMI TADAHIRO124 citations97
US6669825B2Dec 30, 2003

Method of forming a dielectric film

OHMI TADAHIRO28 citations96
US6551948B2Apr 22, 2003

Flash memory device and a fabrication process thereof, method of forming a dielectric film

OHMI TADAHIRO57 citations96
US6450190B2Sep 17, 2002

Method of detecting abnormalities in flow rate in pressure-type flow controller

OHMI TADAHIRO57 citations96
US6039360AMar 21, 2000

Couplings for fluid controllers

OHMI TADAHIRO82 citations96
US5975112ANov 2, 1999

Fluid control device

OHMI TADAHIRO85 citations96
US5714795AFeb 3, 1998

Semiconductor device utilizing silicide reaction

OHMI TADAHIRO89 citations96

FUJIKIN KK

11 patents
US5816285AOct 6, 1998

Pressure type flow rate control apparatus

FUJIKIN KK139 citations98
US6152168ANov 28, 2000

Pressure-type flow rate control apparatus

FUJIKIN KK112 citations97
US6871803B1Mar 29, 2005

Valve with an integral orifice

FUJIKIN KK61 citations96
US6820632B2Nov 23, 2004

Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus

FUJIKIN KK39 citations96
US6422264B2Jul 23, 2002

Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus

FUJIKIN KK64 citations96
US6314992B1Nov 13, 2001

Fluid-switchable flow rate control system

FUJIKIN KK62 citations96
US6302130B1Oct 16, 2001

Method and apparatus for detection of orifice clogging in pressure-type flow rate controllers

FUJIKIN KK77 citations96
US6289923B1Sep 18, 2001

Gas supply system equipped with pressure-type flow rate control unit

FUJIKIN KK61 citations96
US6273139B1Aug 14, 2001

Fluid control apparatus

FUJIKIN KK70 citations96
US5769110AJun 23, 1998

Fluid control apparatus

FUJIKIN KK85 citations96
US5366261ANov 22, 1994

Pipe joint with a gasket retainer

FUJIKIN KK58 citations96

CANON KK

4 patents
US6255731B1Jul 3, 2001

SOI bonding structure

CANON KK179 citations98
US6051851AApr 18, 2000

Semiconductor devices utilizing silicide reaction

CANON KK122 citations98
US5753320AMay 19, 1998

Process for forming deposited film

CANON KK73 citations96
US5728278AMar 17, 1998

Plasma processing apparatus

CANON KK73 citations96

(unassigned)

4 patents
US5954885ASep 21, 1999

Cleaning method

63 citations96
US5944907AAug 31, 1999

Cleaning device and method

56 citations96
US5840368ANov 24, 1998

Apparatus for forming low-temperature oxide films and method of forming low-temperature oxide films

62 citations96
US5621336AApr 15, 1997

Neuron circuit

68 citations96

ALPS ELECTRIC CO LTD

3 patents
US6792889B2Sep 21, 2004

Plasma processing apparatus and method capable of performing uniform plasma treatment by control of excitation power

ALPS ELECTRIC CO LTD179 citations99
US6230722B1May 15, 2001

Liquid feed nozzle, wet treatment, apparatus and wet treatment method

ALPS ELECTRIC CO LTD172 citations98
US6270618B1Aug 7, 2001

Plasma processing apparatus

ALPS ELECTRIC CO LTD59 citations96

NIPPON OXYGEN CO LTD

3 patents
US6343239B1Jan 29, 2002

Transportation method for substrate wafers and transportation apparatus

NIPPON OXYGEN CO LTD360 citations99
US5953591ASep 14, 1999

Process for laser detection of gas and contaminants in a wafer transport gas tunnel

NIPPON OXYGEN CO LTD217 citations99
US6217633B1Apr 17, 2001

Method and apparatus for recovering rare gas

NIPPON OXYGEN CO LTD51 citations96

TADAHIRO OHMI

3 patents
US6615871B2Sep 9, 2003

Fluid control apparatus

TADAHIRO OHMI61 citations96
US5988217ANov 23, 1999

Shutoff-opening device

TADAHIRO OHMI57 citations96
US5858106AJan 12, 1999

Cleaning method for peeling and removing photoresist

TADAHIRO OHMI106 citations96

TOKYO ELECTRON LTD

2 patents
US6830652B1Dec 14, 2004

Microwave plasma processing apparatus

TOKYO ELECTRON LTD84 citations98
US7012311B2Mar 14, 2006

Semiconductor device formed on (111) surface of a Si crystal and fabrication process thereof

TOKYO ELECTRON LTD45 citations96

SHINETSU HANDOTAI KK

2 patents
US7052974B2May 30, 2006

Bonded wafer and method of producing bonded wafer

SHINETSU HANDOTAI KK47 citations96
US6958094B2Oct 25, 2005

Single crystal cutting method

SHINETSU HANDOTAI KK56 citations96

ZAIDAN HOJIN HANDOTAI KENKYU

1 patent
US5384476AJan 24, 1995

Short channel MOSFET with buried anti-punch through region

ZAIDAN HOJIN HANDOTAI KENKYU139 citations99

HANDOTAI KENKYU SHINKOKAI

1 patent
US4558660ADec 17, 1985

Semiconductor fabricating apparatus

HANDOTAI KENKYU SHINKOKAI148 citations99

TAIYO NIPPON SANSO CORP

1 patent
US7258725B2Aug 21, 2007

Gas supplying method and system

TAIYO NIPPON SANSO CORP67 citations98

ORGANO CORP

1 patent
US5783790AJul 21, 1998

Wet treatment method

ORGANO CORP56 citations96

HASHIMOTO CHEMICAL IND

1 patent
US5277835AJan 11, 1994

Surface treatment agent for fine surface treatment

HASHIMOTO CHEMICAL IND51 citations96

Showing the top 50 of 601 patents by PatentIndex Score.