Inventor

SAITOH KENJI

JP79 patents

⚠️ This page may combine multiple inventors who share the name “SAITOH KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAITOH KENJI

CANON KK

Wireless communication apparatus and method

Two scanning probes information recording/reproducing system with one probe to detect atomic reference location on a recording medium

Encoder for controlling measurements in the range of a few angstroms

Wavelength compensator in a helium ambience

Measuring method and apparatus for meausring the positional relationship of first and second gratings

Device for detecting positional relationship between two objects

Multi-axis wafer position detecting system using a mark having optical power

Position detection method and apparatus

Alignment apparatus and SOR x-ray exposure apparatus having same

System and method for detecting the relative positional deviation between diffraction gratings and for measuring the width of a line constituting a diffraction grating

Exposure method and apparatus

Method for setting mask pattern and illumination condition

Position detecting apparatus

Position detecting system and device manufacturing method using the same

Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object

Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters

Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes

Method and apparatus for measuring positional deviation while correcting an error on the basis of the error detection by an error detecting means

Position detector for detecting the position of an object using a diffraction grating positioned at an angle

Method and apparatus for measuring deviation between patterns on a semiconductor wafer

Position detecting method and apparatus

Position detecting device employing marks and oblique projection

Multiple exposure device formation

Multiple exposure method

Alignment apparatus and SOR X-ray exposure apparatus having same

Illuminating apparatus and surface inspection system using illuminating apparatus

Illuminating apparatus and image sensing system including illuminating apparatus

Image pickup optical system

Mask and its manufacturing method, exposure, and device fabrication method

Interferometer and interferance measurement method

Position detecting apparatus and a method for manufacturing semiconductor devices using the apparatus

Device for detecting the relative position between opposed first and second objects

Polymerizable film and pattern forming method by use thereof

Mask manufacturing method

Optical system and optical instrument with diffractive optical element

Multiple exposure method

Rotational deviation detecting method and system using a periodic pattern

Position detecting method

Method and apparatus for measuring an interval between two objects

NEC CORP

Non-volatile semiconductor storage apparatus and production thereof

Non-volatile semiconductor memory device having a floating gate inside a grove

Method of making non-volatile semiconductor memory device with the floating gate having upper and lower impurity concentrations

Method of manufacturing non-volatile semiconductor memory having erasing gate

Semiconductor non-volatile storage device having verification potential applying device for re-writing to insufficiently written memory cells

Non-volatile semiconductor memory device

Non-volatile semiconductor memory device having a memory cell group operative as a redundant memory cell group for replacement of another group

Electrically erasable and programmable read only memory device having selectively erasable sectors

TOSHIBA SILICONE

Surface treated polymethylsilsesquioxane powder

OTA KAZUYUKI

Measurement system and measurement processing method

MITSUBISHI ELECTRIC CORP

Semiconductor device manufacturing method