Inventor
LI NIEN-CHUNG
TW32 patents
⚠️ This page may combine multiple inventors who share the name “LI NIEN-CHUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
UNITED MICROELECTRONICS CORP
31 patentsUS9985129B2May 29, 2018
High-voltage metal-oxide-semiconductor transistor and fabrication method thereof
UNITED MICROELECTRONICS CORP6 citations84
US9761657B2Sep 12, 2017
Metal-oxide-semiconductor transistor and method of forming gate layout
UNITED MICROELECTRONICS CORP8 citations84
US9741850B1Aug 22, 2017
Semiconductor device and method for forming the same
UNITED MICROELECTRONICS CORP12 citations84
US9716139B2Jul 25, 2017
Method for forming high voltage transistor
UNITED MICROELECTRONICS CORP8 citations83
US9653460B1May 16, 2017
Semiconductor device and method of fabricating the same
UNITED MICROELECTRONICS CORP8 citations83
US7618856B2Nov 17, 2009
Method for fabricating strained-silicon CMOS transistors
UNITED MICROELECTRONICS CORP13 citations83
US9431239B1Aug 30, 2016
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP6 citations81
US7592262B2Sep 22, 2009
Method for manufacturing MOS transistors utilizing a hybrid hard mask
UNITED MICROELECTRONICS CORP10 citations81
US11495681B2Nov 8, 2022
Semiconductor device and manufacturing method thereof
UNITED MICROELECTRONICS CORP2 citations73
US10204996B2Feb 12, 2019
Metal-oxide-semiconductor transistor and method of forming gate layout
UNITED MICROELECTRONICS CORP3 citations73
US9859417B2Jan 2, 2018
High-voltage metal-oxide-semiconductor transistor and fabrication method thereof
UNITED MICROELECTRONICS CORP4 citations73
US11682726B2Jun 20, 2023
High voltage semiconductor device and manufacturing method thereof
UNITED MICROELECTRONICS CORP2 citations72
US10411088B2Sep 10, 2019
Semiconductor device
UNITED MICROELECTRONICS CORP2 citations72
US9972678B2May 15, 2018
Semiconductor device and method of forming the same
UNITED MICROELECTRONICS CORP3 citations72
US9577069B1Feb 21, 2017
Method of fabricating semiconductor MOS device
UNITED MICROELECTRONICS CORP5 citations72
US9391197B1Jul 12, 2016
Semiconductor device and operating method thereof
UNITED MICROELECTRONICS CORP3 citations72
US9224859B1Dec 29, 2015
High voltage metal-oxide-semiconductor transistor device
UNITED MICROELECTRONICS CORP4 citations72
US12557331B2Feb 17, 2026
Transistor structure
UNITED MICROELECTRONICS CORP0 citations62
US12206020B2Jan 21, 2025
High voltage semiconductor device
UNITED MICROELECTRONICS CORP0 citations62
US12080794B2Sep 3, 2024
Manufacturing method of high voltage semiconductor device
UNITED MICROELECTRONICS CORP0 citations62
US10290718B2May 14, 2019
Metal-oxide-semiconductor transistor and method of forming gate layout
UNITED MICROELECTRONICS CORP0 citations52
US10535734B2Jan 14, 2020
Method for fabricating semiconductor device
UNITED MICROELECTRONICS CORP0 citations51
US10497805B2Dec 3, 2019
Semiconductor structure and manufacturing method of the same
UNITED MICROELECTRONICS CORP0 citations51
US10396157B1Aug 27, 2019
Semiconductor device
UNITED MICROELECTRONICS CORP0 citations51
US10084083B1Sep 25, 2018
Semiconductor structure and manufacturing method of the same
UNITED MICROELECTRONICS CORP0 citations51
US9972539B2May 15, 2018
Method of fabricating semiconductor device
UNITED MICROELECTRONICS CORP1 citations51
US12464762B2Nov 4, 2025
EDMOS and fabricating method of the same
UNITED MICROELECTRONICS CORP0 citations50
US10475903B2Nov 12, 2019
Method of forming transistor with dual spacer
UNITED MICROELECTRONICS CORP0 citations50
US10453938B2Oct 22, 2019
Transistor with dual spacer and forming method thereof
UNITED MICROELECTRONICS CORP0 citations50
US6955929B2Oct 18, 2005
Method of measuring a gate channel length of a metal-oxide semiconductor transistor
UNITED MICROELECTRONICS CORP1 citations44
US9852952B2Dec 26, 2017
Semiconductor device and method for fabricating the same
UNITED MICROELECTRONICS CORP0 citations41