P

Inventor

SATO MITSUYA

JP31 patents
⚠️ This page may combine multiple inventors who share the name “SATO MITSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

25 patents
US4864227ASep 5, 1989

Wafer prober

CANON KK152 citations99
US4929893AMay 29, 1990

Wafer prober

CANON KK206 citations98
US4789294ADec 6, 1988

Wafer handling apparatus and method

CANON KK593 citations98
US7009683B2Mar 7, 2006

Exposure apparatus

CANON KK61 citations96
US5608492AMar 4, 1997

Scanning type exposure apparatus and method and device manufacturing method

CANON KK53 citations96
US4755747AJul 5, 1988

Wafer prober and a probe card to be used therewith

CANON KK123 citations96
US4677474AJun 30, 1987

Wafer prober

CANON KK92 citations95
US6369876B1Apr 9, 2002

Exposure apparatus and method, device manufacturing method, and discharge lamp

CANON KK15 citations92
US5753926AMay 19, 1998

Scan type exposure apparatus and method having a reference plate with marks for image detection

CANON KK24 citations92
US4934064AJun 19, 1990

Alignment method in a wafer prober

CANON KK46 citations92
US4496239AJan 29, 1985

Projection exposure apparatus

CANON KK46 citations92
US4747608AMay 31, 1988

Wafer chuck

CANON KK33 citations91
US4870288ASep 26, 1989

Alignment method

CANON KK29 citations90
US7898119B2Mar 1, 2011

Planar motor and stage using the same

CANON KK9 citations84
US6166505ADec 26, 2000

Interlocking apparatus

CANON KK16 citations84
US4569562AFeb 11, 1986

Method of and apparatus for controlling a fluid bearing

CANON KK19 citations82
US4659227AApr 21, 1987

Alignment apparatus

CANON KK21 citations81
US7245349B2Jul 17, 2007

Exposure apparatus

CANON KK8 citations74
US6888618B2May 3, 2005

Exposure apparatus and exposure method

CANON KK8 citations74
US6862079B2Mar 1, 2005

Light source, light source generation control method, exposure apparatus and maintenance method therefor, and semiconductor device manufacturing method and semiconductor production facility

CANON KK10 citations74
US6771353B2Aug 3, 2004

Exposure apparatus and method, device manufacturing method, and discharge lamp

CANON KK11 citations74
US7551264B2Jun 23, 2009

Exposure apparatus

CANON KK1 citations63
US7079222B2Jul 18, 2006

Exposure apparatus

CANON KK3 citations63
US7050153B2May 23, 2006

Exposure apparatus

CANON KK0 citations52
US7772727B2Aug 10, 2010

Planar pulse motor, exposure apparatus, and device manufacturing method

CANON KK0 citations42

HITACHI LTD

4 patents

TOSHIBA TEC KK

1 patent

SATO MITSUYA

1 patent