P

Inventor

YASUDA HIROSHI

JP327 patents
⚠️ This page may combine multiple inventors who share the name “YASUDA HIROSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJITSU LTD

22 patents
US5260579ANov 9, 1993

Charged particle beam exposure system and charged particle beam exposure method

FUJITSU LTD167 citations99
US5369282ANov 29, 1994

Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput

FUJITSU LTD143 citations98
US6646275B2Nov 11, 2003

Charged particle beam exposure system and method

FUJITSU LTD43 citations96
US6118129ASep 12, 2000

Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements

FUJITSU LTD30 citations96
US5977548ANov 2, 1999

Charged particle beam exposure system and method

FUJITSU LTD28 citations96
US5854490ADec 29, 1998

Charged-particle-beam exposure device and charged-particle-beam exposure method

FUJITSU LTD46 citations96
US5841145ANov 24, 1998

Method of and system for exposing pattern on object by charged particle beam

FUJITSU LTD60 citations96
US5814423ASep 29, 1998

Transmission mask for charged particle beam exposure apparatuses, and an exposure apparatus using such a transmission mask

FUJITSU LTD57 citations96
US5614725AMar 25, 1997

Charged particle beam exposure system and method

FUJITSU LTD36 citations96
US5528048AJun 18, 1996

Charged particle beam exposure system and method

FUJITSU LTD47 citations96
US5262341ANov 16, 1993

Blanking aperture array and charged particle beam exposure method

FUJITSU LTD66 citations96
US5173582ADec 22, 1992

Charged particle beam lithography system and method

FUJITSU LTD63 citations96
US5144142ASep 1, 1992

Blanking aperture array, method for producing blanking aperture array, charged particle beam exposure apparatus and charged particle beam exposure method

FUJITSU LTD78 citations96
US4684315AAug 4, 1987

Frictionless supporting apparatus

FUJITSU LTD72 citations96
US6064807AMay 16, 2000

Charged-particle beam exposure system and method

FUJITSU LTD77 citations94
US6486479B1Nov 26, 2002

Charged particle beam exposure system and method

FUJITSU LTD24 citations93
US5359202AOct 25, 1994

Electron beam exposure apparatus employing blanking aperture array

FUJITSU LTD23 citations93
US5288567AFeb 22, 1994

Stencil mask and charged particle beam exposure method and apparatus using the stencil mask

FUJITSU LTD24 citations93
US5245194ASep 14, 1993

Electron beam exposure system having an electrostatic deflector wherein an electrostatic charge-up is eliminated

FUJITSU LTD21 citations93
US5051556ASep 24, 1991

Charged particle beam lithography system and a method thereof

FUJITSU LTD43 citations93
US4735881AApr 5, 1988

Method for forming patterns by using a high-current-density electron beam

FUJITSU LTD37 citations93
US4145597AMar 20, 1979

Electron beam lithographic system

FUJITSU LTD42 citations93

SONY CORP

7 patents

TSUBAKIMOTO CHAIN CO

4 patents

TOYODA GOSEI KK

3 patents

MATSUSHITA ELECTRIC INDUSTRIAL CO LTD

3 patents

TOSHIBA KK

2 patents

TOKYO SHIBAURA ELECTRIC CO

2 patents

NIPPON TELEGRAPH & TELEPHONE

1 patent

SHOWA DENKO KK

1 patent

(unassigned)

1 patent

RICOH KK

1 patent

TOYOTA RES INST INC

1 patent

MORI SEIKI HITECH CO LTD

1 patent

ADVANTEST CORP

1 patent

Showing the top 50 of 327 patents by PatentIndex Score.