Inventor
HAUSE FRED
US27 patents
⚠️ This page may combine multiple inventors who share the name “HAUSE FRED”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ADVANCED MICRO DEVICES INC
19 patentsUS6225168B1May 1, 2001
Semiconductor device having metal gate electrode and titanium or tantalum nitride gate dielectric barrier layer and process of fabrication thereof
ADVANCED MICRO DEVICES INC239 citations99
US6080640AJun 27, 2000
Metal attachment method and structure for attaching substrates at low temperatures
ADVANCED MICRO DEVICES INC291 citations99
US6097096AAug 1, 2000
Metal attachment method and structure for attaching substrates at low temperatures
ADVANCED MICRO DEVICES INC116 citations98
US5789298AAug 4, 1998
High performance mosfet structure having asymmetrical spacer formation and method of making the same
ADVANCED MICRO DEVICES INC67 citations96
US6967160B1Nov 22, 2005
Method of manufacturing semiconductor device having nickel silicide with reduced interface roughness
ADVANCED MICRO DEVICES INC18 citations92
US5841168ANov 24, 1998
High performance asymmetrical MOSFET structure and method of making the same
ADVANCED MICRO DEVICES INC26 citations92
US5827763AOct 27, 1998
Method of forming a multiple transistor channel doping using a dual resist fabrication sequence
ADVANCED MICRO DEVICES INC25 citations92
US6054385AApr 25, 2000
Elevated local interconnect and contact structure
ADVANCED MICRO DEVICES INC18 citations84
US6027859AFeb 22, 2000
Semiconductor substrate having extended scribe line test structure and method of fabrication thereof
ADVANCED MICRO DEVICES INC17 citations84
US5821146AOct 13, 1998
Method of fabricating FET or CMOS transistors using MeV implantation
ADVANCED MICRO DEVICES INC19 citations84
US5747852AMay 5, 1998
LDD MOS transistor with improved uniformity and controllability of alignment
ADVANCED MICRO DEVICES INC17 citations79
US6873051B1Mar 29, 2005
Nickel silicide with reduced interface roughness
ADVANCED MICRO DEVICES INC11 citations74
US6117742ASep 12, 2000
Method for making a high performance transistor
ADVANCED MICRO DEVICES INC8 citations74
US6043533AMar 28, 2000
Method of integrating Ldd implantation for CMOS device fabrication
ADVANCED MICRO DEVICES INC8 citations74
US5952702ASep 14, 1999
High performance MOSFET structure having asymmetrical spacer formation and having source and drain regions with different doping concentration
ADVANCED MICRO DEVICES INC15 citations74
US5763311AJun 9, 1998
High performance asymmetrical MOSFET structure and method of making the same
ADVANCED MICRO DEVICES INC7 citations74
US6159814ADec 12, 2000
Spacer formation by poly stack dopant profile design
ADVANCED MICRO DEVICES INC9 citations72
US7670932B2Mar 2, 2010
MOS structures with contact projections for lower contact resistance and methods for fabricating the same
ADVANCED MICRO DEVICES INC2 citations62
US6242330B1Jun 5, 2001
Process for breaking silicide stringers extending between silicide areas of different active regions
ADVANCED MICRO DEVICES INC0 citations52