P

Inventor

OKUBO YASUSHI

JP47 patents
⚠️ This page may combine multiple inventors who share the name “OKUBO YASUSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HOYA CORP

19 patents
US7314690B2Jan 1, 2008

Photomask producing method and photomask blank

HOYA CORP9 citations80
US10101650B2Oct 16, 2018

Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device

HOYA CORP2 citations73
US8043771B2Oct 25, 2011

Phase shift mask blank and method of manufacturing phase shift mask

HOYA CORP6 citations63
US7794900B2Sep 14, 2010

Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate

HOYA CORP2 citations63
US7655364B2Feb 2, 2010

Methods of manufacturing mask blank and transfer mask

HOYA CORP3 citations63
US9494852B2Nov 15, 2016

Mask blank and method of manufacturing phase shift mask

HOYA CORP2 citations62
US8048591B2Nov 1, 2011

Mask blank glass substrate, mask blank glass substrate manufacturing method, mask blank manufacturing method, and mask manufacturing method

HOYA CORP4 citations60
US8021804B2Sep 20, 2011

Photomask manufacturing method

HOYA CORP4 citations60
US7713663B2May 11, 2010

Mask blank, manufacturing method of mask blank, manufacturing method of transfer mask and manufacturing method of semiconductor device

HOYA CORP2 citations60
US7709161B2May 4, 2010

Photomask producing method and photomask blank

HOYA CORP4 citations59
US10527931B2Jan 7, 2020

Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device

HOYA CORP0 citations52
US9952497B2Apr 24, 2018

Mask blank and method of manufacturing phase shift mask

HOYA CORP0 citations52
US7794901B2Sep 14, 2010

Method of manufacturing mask blank and transfer mask

HOYA CORP0 citations52
US7648807B2Jan 19, 2010

Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate

HOYA CORP0 citations52
US7901842B2Mar 8, 2011

Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor device

HOYA CORP1 citations51
US7955763B2Jun 7, 2011

Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask

HOYA CORP0 citations50
US7851108B2Dec 14, 2010

Mask blank glass substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, mask blank glass substrate, mask blank, and mask

HOYA CORP0 citations50
US8048596B2Nov 1, 2011

Photomask producing method and photomask blank

HOYA CORP0 citations48
US8367276B2Feb 5, 2013

Mask blank and method of manufacturing mask

HOYA CORP0 citations41

OKUBO YASUSHI

6 patents

KONICA MINOLTA INC

5 patents

KONICA CORP

5 patents

KONISHIROKU PHOTO IND

2 patents

KONICA MINOLTA HOLDINGS INC

2 patents

WACHI AYAKO

2 patents

YAMADA TAKEYUKI

2 patents

YUYAMA MFG CO LTD

1 patent

KONICA MINOLTA OPTO INC

1 patent

NOJIMA TAKAHIKO

1 patent

HASHIMOTO MASAHIRO

1 patent