P

Inventor

TOSHIMA TAKAYUKI

JP74 patents
⚠️ This page may combine multiple inventors who share the name “TOSHIMA TAKAYUKI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TOKYO ELECTRON LTD

42 patents
US6709523B1Mar 23, 2004

Silylation treatment unit and method

TOKYO ELECTRON LTD53 citations96
US6514073B1Feb 4, 2003

Resist processing method and resist processing apparatus

TOKYO ELECTRON LTD61 citations96
US5817185AOct 6, 1998

Method for washing substrates

TOKYO ELECTRON LTD48 citations96
US5730162AMar 24, 1998

Apparatus and method for washing substrates

TOKYO ELECTRON LTD67 citations96
US6817790B2Nov 16, 2004

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD23 citations93
US6817368B2Nov 16, 2004

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD17 citations93
US6634806B2Oct 21, 2003

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD39 citations93
US6143478ANov 7, 2000

Resist processing method

TOKYO ELECTRON LTD17 citations93
US4899686AFeb 13, 1990

Coating device

TOKYO ELECTRON LTD49 citations93
US6620260B2Sep 16, 2003

Substrate rinsing and drying method

TOKYO ELECTRON LTD28 citations92
US6613692B1Sep 2, 2003

Substrate processing method and apparatus

TOKYO ELECTRON LTD35 citations92
US6551400B2Apr 22, 2003

Coating apparatus

TOKYO ELECTRON LTD21 citations92
US6503003B2Jan 7, 2003

Film forming method and film forming apparatus

TOKYO ELECTRON LTD19 citations92
US6491452B2Dec 10, 2002

Developing method and developing apparatus

TOKYO ELECTRON LTD16 citations92
US6228561B1May 8, 2001

Film forming method and film forming apparatus

TOKYO ELECTRON LTD36 citations92
US6097469AAug 1, 2000

Method of processing resist onto substrate and resist processing apparatus

TOKYO ELECTRON LTD24 citations92
US6017663AJan 25, 2000

Method of processing resist utilizing alkaline component monitoring

TOKYO ELECTRON LTD25 citations92
US5932380AAug 3, 1999

Method of processing resist utilizing alkaline component monitoring

TOKYO ELECTRON LTD29 citations92
US5928390AJul 27, 1999

Vertical processing apparatus

TOKYO ELECTRON LTD45 citations92
US5633040AMay 27, 1997

Method and apparatus for treating film coated on substrate

TOKYO ELECTRON LTD26 citations91
US6536452B1Mar 25, 2003

Processing apparatus and processing method

TOKYO ELECTRON LTD28 citations90
US7998308B2Aug 16, 2011

Liquid processing apparatus

TOKYO ELECTRON LTD16 citations84
US7793610B2Sep 14, 2010

Liquid processing apparatus

TOKYO ELECTRON LTD8 citations84
US7482281B2Jan 27, 2009

Substrate processing method

TOKYO ELECTRON LTD14 citations84
US6869499B2Mar 22, 2005

Substrate processing method and substrate processing apparatus

TOKYO ELECTRON LTD15 citations84
US6713239B2Mar 30, 2004

Developing method and developing apparatus

TOKYO ELECTRON LTD14 citations84
US6688020B2Feb 10, 2004

Substrate processing apparatus

TOKYO ELECTRON LTD14 citations84
US6656273B1Dec 2, 2003

Film forming method and film forming system

TOKYO ELECTRON LTD18 citations84
US7063094B2Jun 20, 2006

Substrate processing apparatus

TOKYO ELECTRON LTD11 citations82
US7300598B2Nov 27, 2007

Substrate processing method and apparatus

TOKYO ELECTRON LTD7 citations74
US6872670B2Mar 29, 2005

Silylation treatment unit and method

TOKYO ELECTRON LTD6 citations74
US6398429B1Jun 4, 2002

Developing method and developing apparatus

TOKYO ELECTRON LTD12 citations74
US6257778B1Jul 10, 2001

Method for developing front surface of substrate with improved developing function of developing solution and apparatus thereof

TOKYO ELECTRON LTD12 citations74
US6238848B1May 29, 2001

Developing method and developing apparatus

TOKYO ELECTRON LTD12 citations74
US10115609B2Oct 30, 2018

Separation and regeneration apparatus and substrate processing apparatus

TOKYO ELECTRON LTD6 citations73
US10046370B2Aug 14, 2018

Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium

TOKYO ELECTRON LTD3 citations73
US9662685B2May 30, 2017

Substrate processing apparatus, substrate processing method, fluid supplying method and storage medium

TOKYO ELECTRON LTD5 citations73
US9583330B2Feb 28, 2017

Supercritical drying method for semiconductor substrate and supercritical drying apparatus

TOKYO ELECTRON LTD2 citations73
US7191785B2Mar 20, 2007

Substrate processing apparatus for resist film removal

TOKYO ELECTRON LTD6 citations73
US9881784B2Jan 30, 2018

Substrate processing method, substrate processing apparatus, and storage medium

TOKYO ELECTRON LTD4 citations72
US7849864B2Dec 14, 2010

Liquid processing system

TOKYO ELECTRON LTD6 citations63
US7410543B2Aug 12, 2008

Substrate processing method

TOKYO ELECTRON LTD2 citations63

TOSHIMA TAKAYUKI

2 patents
US8465596B2Jun 18, 2013

Supercritical processing apparatus and supercritical processing method

TOSHIMA TAKAYUKI5 citations72
US8434423B2May 7, 2013

Substrate carrying apparatus having circumferential sidewall and substrate processing system

TOSHIMA TAKAYUKI6 citations72

HIROSHIRO KOUKICHI

1 patent
US8701308B2Apr 22, 2014

Fluid heater, manufacturing method thereof, substrate processing apparatus including fluid heater, and substrate processing method

HIROSHIRO KOUKICHI14 citations82

JI LINAN

1 patent
US8771429B2Jul 8, 2014

Supercritical drying method for semiconductor substrate and supercritical drying apparatus

JI LINAN5 citations79

SONY CORP

1 patent
US7229522B2Jun 12, 2007

Substrate processing apparatus and substrate processing method

SONY CORP8 citations74

TOSHIBA KK

1 patent
US8372212B2Feb 12, 2013

Supercritical drying method and apparatus for semiconductor substrates

TOSHIBA KK5 citations72

TANAKA TAKASHI

1 patent
US9421569B2Aug 23, 2016

Plating apparatus, plating method and storage medium

TANAKA TAKASHI2 citations63

TOKYO OHKA KOGYO CO LTD

1 patent
US11441101B2Sep 13, 2022

Cleaning composition, cleaning method, and method for manufacturing semiconductor

TOKYO OHKA KOGYO CO LTD1 citations62

Showing the top 50 of 74 patents by PatentIndex Score.