Inventor
LI SHOUTIAN
US17 patents
⚠️ This page may combine multiple inventors who share the name “LI SHOUTIAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CABOT MICROELECTRONICS CORP
6 patentsUS11034862B2Jun 15, 2021
Polishing composition and method utilizing abrasive particles treated with an aminosilane
CABOT MICROELECTRONICS CORP1 citations73
US9617450B2Apr 11, 2017
Polishing composition and method utilizing abrasive particles treated with an aminosilane
CABOT MICROELECTRONICS CORP1 citations62
US7820067B2Oct 26, 2010
Halide anions for metal removal rate control
CABOT MICROELECTRONICS CORP6 citations62
US10508219B2Dec 17, 2019
Polishing composition and method utilizing abrasive particles treated with an aminosilane
CABOT MICROELECTRONICS CORP0 citations52
US7998228B2Aug 16, 2011
Tantalum CMP compositions and methods
CABOT MICROELECTRONICS CORP0 citations51
US7803203B2Sep 28, 2010
Compositions and methods for CMP of semiconductor materials
CABOT MICROELECTRONICS CORP1 citations51
LI SHOUTIAN
4 patentsUS8252687B2Aug 28, 2012
Barrier slurry for low-k dielectrics
LI SHOUTIAN29 citations91
US9951054B2Apr 24, 2018
CMP porous pad with particles in a polymeric matrix
LI SHOUTIAN15 citations77
US8591763B2Nov 26, 2013
Halide anions for metal removal rate control
LI SHOUTIAN4 citations60
US8551202B2Oct 8, 2013
Iodate-containing chemical-mechanical polishing compositions and methods
LI SHOUTIAN0 citations51