Inventor
KAI JUNICHI
JP30 patents
Patents
30 patentsUS5260579ANov 9, 1993
Charged particle beam exposure system and charged particle beam exposure method
FUJITSU LTD167 citations99
US5369282ANov 29, 1994
Electron beam exposure method and system for exposing a pattern on a substrate with an improved accuracy and throughput
FUJITSU LTD143 citations98
US6646275B2Nov 11, 2003
Charged particle beam exposure system and method
FUJITSU LTD43 citations96
US6118129ASep 12, 2000
Method and system for exposing an exposure pattern on an object by a charged particle beam which is shaped into a plurality of beam elements
FUJITSU LTD30 citations96
US5977548ANov 2, 1999
Charged particle beam exposure system and method
FUJITSU LTD28 citations96
US5841145ANov 24, 1998
Method of and system for exposing pattern on object by charged particle beam
FUJITSU LTD60 citations96
US5614725AMar 25, 1997
Charged particle beam exposure system and method
FUJITSU LTD36 citations96
US5528048AJun 18, 1996
Charged particle beam exposure system and method
FUJITSU LTD47 citations96
US6064807AMay 16, 2000
Charged-particle beam exposure system and method
FUJITSU LTD77 citations94
US5920077AJul 6, 1999
Charged particle beam exposure system
FUJITSU LTD21 citations92
US5866300AFeb 2, 1999
Method of and system for exposing pattern on object by charged particle beam
FUJITSU LTD25 citations92
US5719402AFeb 17, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD32 citations92
US5546319AAug 13, 1996
Method of and system for charged particle beam exposure
FUJITSU LTD21 citations92
US5399872AMar 21, 1995
Charged-particle beam exposure method
FUJITSU LTD51 citations92
US5334846AAug 2, 1994
Correction of charged particle beam exposure deflection by detecting stage position and a position detection mark
FUJITSU LTD25 citations92
US4980567ADec 25, 1990
Charged particle beam exposure system using line beams
FUJITSU LTD34 citations92
US4586141AApr 29, 1986
Method and apparatus for an electron beam exposure system
FUJITSU LTD28 citations92
US5329130AJul 12, 1994
Charged particle beam exposure method and apparatus
FUJITSU LTD33 citations91
US5965895AOct 12, 1999
Method of providing changed particle beam exposure in which representative aligning marks on an object are detected to calculate an actual position to perform exposure
FUJITSU LTD13 citations82
US5721432AFeb 24, 1998
Method of and system for charged particle beam exposure
FUJITSU LTD16 citations82
US6057907AMay 2, 2000
Method of and system for exposing pattern on object by charged particle beam
FUJITSU LTD12 citations74
US5180920AJan 19, 1993
Method and apparatus for making charged particle beam exposure
FUJITSU LTD9 citations74
US5631113AMay 20, 1997
Electron-beam exposure system for reduced distortion of electron beam spot
FUJITSU LTD7 citations73
US5610406AMar 11, 1997
Charged particle beam exposure method and apparatus
FUJITSU LTD11 citations73
US5444257AAug 22, 1995
Electron-beam exposure system for reduced distortion of electron beam spot
FUJITSU LTD8 citations73
US5225684AJul 6, 1993
Charged particle beam exposure apparatus control system and a method of operation for providing a drawing start signal
FUJITSU LTD12 citations73
US5134300AJul 28, 1992
Method and apparatus for controlling charged particle beams in charged particle beam exposure system
FUJITSU LTD14 citations73
US4950910AAug 21, 1990
Electron beam exposure method and apparatus
FUJITSU LTD16 citations72
US4516030AMay 7, 1985
Scanning electron beam exposure system
FUJITSU LTD10 citations72
US5434795AJul 18, 1995
Method of forming pattern having optical angle in charged particle exposure system
FUJITSU LTD6 citations62