Inventor
TAKAI KOSUKE
JP22 patents
⚠️ This page may combine multiple inventors who share the name “TAKAI KOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KIOXIA CORP
10 patentsUS12326660B2Jun 10, 2025
Pattern forming method, combined processing apparatus, and recording medium
KIOXIA CORP0 citations60
US11776823B2Oct 3, 2023
Substrate processing method and substrate processing apparatus
KIOXIA CORP0 citations60
US11682566B2Jun 20, 2023
Processing apparatus for processing substrates of different types
KIOXIA CORP0 citations60
US11443963B2Sep 13, 2022
Substrate processing method and substrate processing apparatus
KIOXIA CORP0 citations60
US11275305B2Mar 15, 2022
Method for producing photomask, method for producing semiconductor device, method for forming pattern, and photomask
KIOXIA CORP0 citations52
US12068244B2Aug 20, 2024
Semiconductor device, template, and method of manufacturing template
KIOXIA CORP0 citations51
US11249391B2Feb 15, 2022
Exposure mask and manufacturing method of same
KIOXIA CORP0 citations51
US11796910B2Oct 24, 2023
Template, manufacturing method of template
KIOXIA CORP0 citations50
US11579537B2Feb 14, 2023
Pattern inspection method and photomask fabrication method
KIOXIA CORP0 citations50
US12532696B2Jan 20, 2026
Substrate processing method and substrate processing device
KIOXIA CORP0 citations49
TOSHIBA MEMORY CORP
7 patentsUS10018904B2Jul 10, 2018
EUV mask and method for manufacturing same
TOSHIBA MEMORY CORP5 citations71
US10012896B2Jul 3, 2018
Lithography mask production method and lithography mask production system
TOSHIBA MEMORY CORP0 citations51
US11123774B2Sep 21, 2021
Substrate processing method, substrate processing apparatus, and composite processing apparatus
TOSHIBA MEMORY CORP0 citations50
US11185895B2Nov 30, 2021
Substrate processing method, substrate processing apparatus, and composite processing apparatus
TOSHIBA MEMORY CORP0 citations49
US10698311B2Jun 30, 2020
Reflection-type exposure mask
TOSHIBA MEMORY CORP0 citations41
US9946150B2Apr 17, 2018
Light reflection type lithography mask, its manufacturing method, mask data generation method and mask blank
TOSHIBA MEMORY CORP0 citations40
US9846357B2Dec 19, 2017
Photomask manufacturing method and photomask
TOSHIBA MEMORY CORP0 citations40
TOSHIBA KK
3 patentsUS9280044B2Mar 8, 2016
Light-reflective photomask and mask blank for EUV exposure, and manufacturing method of semiconductor device
TOSHIBA KK2 citations61
US7932002B2Apr 26, 2011
Reflection-type mask and method of making the reflection-type mask
TOSHIBA KK5 citations61
US8007960B2Aug 30, 2011
Light reflecting mask, exposure apparatus, and measuring method
TOSHIBA KK0 citations51