Inventor

HILL ANDREW V

US56 patents

⚠️ This page may combine multiple inventors who share the name “HILL ANDREW V”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HILL ANDREW V

KLA CORP

Metrology target for scanning metrology

Multi-field scanning overlay metrology

Scanning scatterometry overlay measurement

Grey-mode scanning scatterometry overlay metrology

Measurement modes for overlay

Pupil-plane beam scanning for metrology

Parallel scatterometry overlay metrology

Multi-directional overlay metrology using multiple illumination parameters and isolated imaging

Moiré scatterometry overlay

Single grab overlay measurement of tall targets

Imaging overlay with mutually coherent oblique illumination

Massive overlay metrology sampling with multiple measurement columns

Enhancing performance of overlay metrology

Scanning overlay metrology with high signal to noise ratio

Modulation of scanning velocity during overlay metrology

Imaging overlay with mutually coherent oblique illumination

Metrology target for scanning metrology

Massive overlay metrology sampling with multiple measurement columns

Broadband illumination tuning

Amplitude asymmetry measurements in overlay metrology

Darkfield imaging of grating target structures for overlay measurement

Sensitive optical metrology in scanning and static modes

Imaging system for buried metrology targets

KLA TENCOR CORP

Overlay metrology using multiple parameter configurations

System and method for spectral tuning of broadband light sources

Simultaneous capturing of overlay signals from multiple targets

Simultaneous capturing of overlay signals from multiple targets

Apodization for pupil imaging scatterometry

Systems and methods for blocking specular reflection and suppressing modulation from periodic features on a specimen

Efficient illumination shaping for scatterometry overlay

Systems for providing illumination in optical metrology

Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology

Systems and methods for metrology with layer-specific illumination spectra

System and method for generating multi-channel tunable illumination from a broadband source

System and method for hyperspectral imaging metrology

Method for reducing aliasing in TDI based imaging

Apodization for pupil imaging scatterometry

High-brightness illumination source for optical metrology

Localized telecentricity and focus optimization for overlay metrology

Systems and methods for metrology with layer-specific illumination spectra

Spectral control system

Off-axis reflective afocal optical relay

Systems for providing illumination in optical metrology

Compound objectives for imaging and scatterometry overlay

KLA TENCOR TECH CORP

Systems and method for simultaneously inspecting a specimen with two distinct channels

Fourier filters and wafer inspection systems

Systems and methods for providing illumination of a specimen for inspection

Serrated Fourier filters and inspection systems

HILL ANDREW V

Discrete polarization scatterometry

Method for reducing aliasing in TDI based imaging