Inventor

LAI CHIEN-WEN

TW52 patents

⚠️ This page may combine multiple inventors who share the name “LAI CHIEN-WEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAI CHIEN-WEN

TAIWAN SEMICONDUCTOR MFG CO LTD

Method and apparatus for integrated circuit mask patterning

Landing metal etch process for improved overlay control

Directional processing to remove a layer or a material formed over a substrate

Self aligned litho etch process patterning method

Fine line patterning methods

Directional processing to remove a layer or a material formed over a substrate

Method for forming semiconductor structure

Methods of forming metal layer structures in semiconductor devices

Methods of forming metal layer structures in semiconductor devices

Method and apparatus for integrated circuit mask patterning

Method of lithographic process evaluation

OPC method with higher degree of freedom

Stacked wafer structure and method for forming the same

Method for forming patterned mask layer

Method for forming semiconductor structure

Landing metal etch process for improved overlay control

Stacked wafer structure and method for forming the same

Line-end extension method and device

Self aligned litho etch process patterning method

Directional deposition for semiconductor fabrication

Fine line patterning methods

Line-end extension method and device

Landing metal etch process for improved overlay control

Method for forming patterned mask layer

Self aligned litho etch process patterning method

Directional deposition for semiconductor fabrication

Fine line patterning methods

Directional deposition for semiconductor fabrication

Structure for chip extension

Method and apparatus for integrated circuit mask patterning

Semiconductor structures and method for manufacturing the same

Integrated circuit and method of forming the same

Pattern formation method using a photo mask for manufacturing a semiconductor device

Signal line patterning for standard cells

Method for optimized wafer process simulation

Pattern modification and patterning process

TAIWAN SEMICONDUCTOR MFG

Regression system and methods for optical proximity correction modeling

Method and apparatus for integrated circuit mask patterning

Photolithography scattering bar structure and method

Photolithography mask having a scattering bar structure that includes transverse linear assist features

UNITED MICROELECTRONICS CORP

Thermal reflow photolithographic process

Alternating phase shifting mask

Phase error monitor pattern and application

Method for improving process window in semi-dense area by using phase shifter

MAGNA ELECTRONICS INC

Method for detecting objects via a vehicular sensing system

Vehicle sensing system with 360 degree near range sensing

MAGNA ELECTRONICS SOLUTIONS GMBH

Ultrasonic detection device to determine interference source by an additional reception mode

QUANTA DISPLAY INC

Automatic air-blown cleaning device for liquid crystal display component in LCD assembly and method thereof

AU OPTRONICS CORP

Automatic air-blown cleaning device for liquid crystal display component in LCD assembly and method thereof

YEN YUNG-SUNG

Method of forming and using photolithography mask having a scattering bar structure