Inventor
KHOJASTEH MAHMOUD M
US13 patents
⚠️ This page may combine multiple inventors who share the name “KHOJASTEH MAHMOUD M”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
11 patentsUS5609989AMar 11, 1997
Acid scavengers for use in chemically amplified photoresists
IBM47 citations94
US6818381B2Nov 16, 2004
Underlayer compositions for multilayer lithographic processes
IBM21 citations92
US6103447AAug 15, 2000
Approach to formulating irradiation sensitive positive resists
IBM25 citations92
US6770419B2Aug 3, 2004
Low silicon-outgassing resist for bilayer lithography
IBM14 citations83
US4665006AMay 12, 1987
Positive resist system having high resistance to oxygen reactive ion etching
IBM21 citations82
US5667938ASep 16, 1997
Acid scavengers for use in chemically amplified photoresists
IBM15 citations80
US6927015B2Aug 9, 2005
Underlayer compositions for multilayer lithographic processes
IBM10 citations73
US6140015AOct 31, 2000
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM9 citations73
US6268436B1Jul 31, 2001
Approach to formulating irradiation sensitive positive resists
IBM9 citations71
US6265134B1Jul 24, 2001
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM1 citations52
USRE34524EJan 25, 1994
Polyimide coating compositions based on meta-dialkyldihydrogen pyromellitate and aromatic diamines
IBM1 citations47