Inventor

YEO GI-SUNG

KR35 patents

⚠️ This page may combine multiple inventors who share the name “YEO GI-SUNG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YEO GI-SUNG

SAMSUNG ELECTRONICS CO LTD

Semiconductor device having sufficient process margin and method of forming same

Semiconductor substrate containing anti-reflective layer

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

Methods of fabricating a semiconductor device

Method of forming fine patterns of semiconductor device

Photomask having a transparency-adjusting layer, method of manufacturing the photomask, and exposure method using the photomask

Method of manufacturing a mask

Method of manufacturing mask

Multi-exposure semiconductor fabrication mask sets and methods of fabricating such multi-exposure mask sets

Method of forming self-aligned contact pads of non-straight type semiconductor memory device

Anti-reflective layer and method for manufacturing semiconductor device using the same

Method of forming fine metal patterns for a semiconductor device using a damascene process

Multilayer alignment keys and alignment method using the same

Method for forming patterns of semiconductor device

Semiconductor devices having Fin-type active areas and methods of manufacturing the same

Multiple exposure apparatus and multiple exposure method using the same

Semiconductor device having sufficient process margin and method of forming same

Flash memory device using double patterning technology and method of manufacturing the same

Semiconductor device having overlay measurement mark and method of fabricating the same

Method of forming a mask structure and method of forming a minute pattern using the same

Semiconductor memory device having high electrical performance and mask and photolithography friendliness

Method of forming trench in semiconductor device

Semiconductor memory device having high electrical performance and mask and photolithography friendliness

Semiconductor memory devices including offset bit lines

Semiconductor memory devices including diagonal bit lines

Method of forming a fine pattern of a semiconductor device using a resist reflow measurement key

Semiconductor memory devices including offset active regions

DRAM devices having an increased density layout

Method of forming pattern

Method of forming pattern

E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same

Methods of performing a photolithography process for forming asymmetric patterns and methods of forming a semiconductor device using the same

KOH CHA-WON

Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same

RYOO MAN-HYOUNG

Semiconductor device having sufficient process margin and method of forming same