Inventor
HUANG YANG-SHAN
NL21 patents
⚠️ This page may combine multiple inventors who share the name “HUANG YANG-SHAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
16 patentsUS11232960B2Jan 25, 2022
Pick-and-place tool having multiple pick up elements
ASML NETHERLANDS BV2 citations72
US11175596B2Nov 16, 2021
Particle traps and barriers for particle suppression
ASML NETHERLANDS BV5 citations71
US11092902B2Aug 17, 2021
Method and apparatus for detecting substrate surface variations
ASML NETHERLANDS BV2 citations70
US12032296B2Jul 9, 2024
Fluid handling system, method and lithographic apparatus
ASML NETHERLANDS BV0 citations62
US11204558B2Dec 21, 2021
Particle suppression systems and methods
ASML NETHERLANDS BV1 citations61
US11003095B2May 11, 2021
Positioning system and lithographic apparatus
ASML NETHERLANDS BV1 citations58
US9811005B2Nov 7, 2017
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations51
US9261798B2Feb 16, 2016
Lithographic apparatus and device manufacturing method
ASML NETHERLANDS BV0 citations51
US11460786B2Oct 4, 2022
Positioning system and a method for positioning a substage or a stage with respect to a frame
ASML NETHERLANDS BV0 citations50
US9921494B2Mar 20, 2018
Lithographic apparatus comprising an actuator, and method for protecting such actuator
ASML NETHERLANDS BV0 citations50
US10705438B2Jul 7, 2020
Lithographic method
ASML NETHERLANDS BV0 citations48
US10571814B2Feb 25, 2020
Lithographic method
ASML NETHERLANDS BV0 citations48
US11137694B2Oct 5, 2021
Particle suppression systems and methods
ASML NETHERLANDS BV0 citations47
US9389518B2Jul 12, 2016
Stage system and a lithographic apparatus
ASML NETHERLANDS BV1 citations47
US11961698B2Apr 16, 2024
Replaceable module for a charged particle apparatus
ASML NETHERLANDS BV0 citations44
US11442369B2Sep 13, 2022
Object stage bearing for lithographic apparatus
ASML NETHERLANDS BV0 citations43