Inventor

SEOK JANG HYEON

KR12 patents

⚠️ This page may combine multiple inventors who share the name “SEOK JANG HYEON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

HANSOL CHEMICAL CO LTD

7 patents

US11414434B2Aug 16, 2022

Rare earth precursor, method of manufacturing same and method of forming thin film using same

HANSOL CHEMICAL CO LTD0 citations61

US11495453B2Nov 8, 2022

Vapor deposition precursor having excellent thermal stability and reactivity and preparing method therefor

HANSOL CHEMICAL CO LTD0 citations59

US11401290B2Aug 2, 2022

Cobalt precursor, method of preparing same and method of manufacturing thin film using same

HANSOL CHEMICAL CO LTD0 citations56

US11472821B2Oct 18, 2022

Precursor compounds for atomic layer deposition (ALD) and chemical vapor deposition (CVD) and ALD/CVD process using the same

HANSOL CHEMICAL CO LTD0 citations55

US12365700B2Jul 22, 2025

Group 4 metal element-containing compound, precursor composition including same, and method for manufacturing thin film using same

HANSOL CHEMICAL CO LTD0 citations53

US11999756B2Jun 4, 2024

Method for producing organometallic compound and thin film fabricated using organometallic compound obtained thereby

HANSOL CHEMICAL CO LTD0 citations48

US11267828B2Mar 8, 2022

Silicon precursor and method of manufacturing silicon-containing thin film using the same

HANSOL CHEMICAL CO LTD0 citations44

DNF CO LTD

5 patents

US9245740B2Jan 26, 2016

Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same

DNF CO LTD18 citations83

US9809608B2Nov 7, 2017

Cyclodisilazane derivative, method for preparing the same and silicon-containing thin film using the same

DNF CO LTD4 citations72

US9586979B2Mar 7, 2017

Amino-silyl amine compound, method for preparing the same and silicon-containing thin-film using the same

DNF CO LTD3 citations72

US10202407B2Feb 12, 2019

Trisilyl amine derivative, method for preparing the same and silicon-containing thin film using the same

DNF CO LTD1 citations62

US9916974B2Mar 13, 2018

Amino-silyl amine compound and the manufacturing method of dielectric film containing Si—N bond by using atomic layer deposition

DNF CO LTD1 citations51